| Type: | Metal Target |
|---|---|
| Shape: | Round |
| Certification: | ISO |
| Packaging: | 1PC Vacuum Forming |
| Purity: | 99.95%Min |
| Size: | Customized |
| Customization: |
|---|
Suppliers with verified business licenses
Audited Supplier 
Sputtering target and evaporation materials manufacturer
| Product Name | Hafnium target/pellets |
| Available Purity | 99.95%min,as you request |
| Available shape | Rectangle, Round, Rotary, Pellets, Ingots,as per your request |
| Size | D50.8x3mm thick, D3x3mm,D6x6mm,As per your request |
| Technolgy | Melting |
| Theoretical Density (g/cc) | 13.31 |
| COA | Available for COA( Certificate of Analysis), please contact sales |
| Quotation | We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation) |
| Application | Evaporation coating,Process,Decoration,LED,Semi, |
| Related products | W, Mo, Ta, Nb, V, Zr, Hf, Ti, Ni, Fe, Cr, Co,etc,Metal Alloy sputtering targets, Ceramic targets |
Description:
Hafnium, symbol Hf, atomic number 72, atomic weight 178.49. The element is a shiny silver-gray transition metal.The melting point is 2227 ºC, the boiling point is 4602 ºC, it is insoluble in water, and the density is 13.31 g/cm3. Hafnium is a plastic metal and becomes hard and brittle when impurities are present. It is stable in air and only darkens on the surface when burned. The filament can be ignited with the flame of a match. Properties similar to zirconium. It does not react with water, dilute acid or strong alkali, but is easily soluble in aqua regia and hydrofluoric acid.
Hf-3N5-COA
Our hafnium target up to 99.95%. Low gas content and uniform particle size distribution.
Hafnium targets are widely used in physical evaporation deposition, magnetron sputtering and other technologies to prepare various thin film materials, such as oxides, nitrides, silicides and metals. In semiconductor manufacturing, hafnium targets are often used to prepare thin film materials such as silicon, silicon nitride, aluminum oxide, and zirconium oxide. These thin film materials play an important role in semiconductor devices, such as improving device stability and performance. In display manufacturing, hafnium targets are often used to prepare transparent electrode materials, such as indium tin oxide (ITO) and zinc oxide (ZnO).
Our factory covers an area of 4000 square meters. It has been certificated with IS09001:2015 quality management system and IS014001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore,India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Regardless of the order volume and size, we will try our best to meet your requirements and we are doing this for years
1.Are you trading company or manufacturer?
Xinkang:We are a professional manufacturer specialized in this field for over 10 years.
2.How long is your delivery time?
XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity.
3.Do you have MOQ?
XinKang:No,We support samples.
4.What is your payment method?
XinKang:T/T in advance, Paypal, Western Union and etc.
Welcome to contact us at any time!
Suppliers with verified business licenses
Audited Supplier 
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