99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating

Product Details
Customization: Available
Type: Ceramic Target
Shape: Round
Diamond Member Since 2018

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  • 99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
  • 99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
  • 99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
  • 99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
  • 99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
  • 99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
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Basic Info.

Model NO.
XK-HfO2
Certification
ISO
Packaging
1PC Vacuum Package
Purity
99.9%-99.99%
Size
Customized
Delivery
15-18days
Certificate
ISO9001:2015
MOQ
1PC
Availability
Target, Wire, Segment, Granule, Ingot, Sheet
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
1′′-8′′, or as per your request
Trademark
XinKang
Origin
China
HS Code
8007009000
Production Capacity
10000PCS/Month

Product Description

99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
Product Name Hafnium Oxide Ceramic sputtering target
Available Purity 99.9%min,as you request
Available shape round, rectangular,pellets
Size 1''- 8''mm,As per your request
Technolgy powder metallurgy
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application  Gate Dielectric Film,Vaccum coating,Process,Decoration,LED,Semi,
Related products ITO,AZO,IGZO, B, C
Hafnium Oxide Targets (HfO2 Targets) are widely used in various advanced applications, especially in the fields of thin film deposition, semiconductor manufacturing, optical coatings, and high-performance materials. These targets are typically used in the sputtering process, where ions bombard the target material (hafnium oxide), causing atoms to be ejected and deposited onto a substrate to form thin films.

Main Uses of Hafnium Oxide Targets:
Semiconductor Industry

High-k Dielectrics for Transistors: The semiconductor industry is one of the primary users of hafnium oxide targets. Hafnium oxide (HfO2) is a high-k dielectric material used to replace silicon dioxide in advanced metal-oxide-semiconductor field-effect transistors (MOSFETs). As transistors shrink in size, traditional materials like silicon dioxide can no longer meet the required capacitance without increasing leakage current. HfO2has a higher dielectric constant, allowing it to maintain performance in smaller devices while reducing leakage. The sputtering of hafnium oxide targets allows for precise deposition of HfO2 thin films on semiconductor wafers, crucial for the production of advanced integrated circuits (ICs) and dynamic random-access memory (DRAM).

Gate Dielectrics: Hafnium oxide is used as a gate dielectric material in CMOS technology, particularly for high-performance transistors. The sputtering technique allows for the deposition of thin, uniform layers of HfO2, which are essential for creating the next generation of faster and more power-efficient transistors.

Optical Coatings

Anti-Reflective Coatings: Hafnium oxide is frequently used in optical coatings, including anti-reflective coatings for lenses, mirrors, and optical filters. Its high refractive index makes it ideal for controlling light reflection, reducing glare, and improving the transmission of light through optical components.

High-Performance Optical Films: HfO2 films are used in high-performance optical devices in the aerospace, defense, and scientific fields. These films are applied to laser optics, telescopic lenses, and camera optics, where precision and durability are critical.

Durability and Stability in Harsh Environments: Hafnium oxide's resistance to heat, radiation, and environmental degradation makes it particularly useful in extreme conditions where standard coatings might fail, such as in space exploration or military applications.

Catalysis and Chemical Applications

Catalytic Supports: Hafnium oxide is used in catalysis for processes such as hydrocarbon cracking and fuel production. When used as a support for other catalyst materials, HfO2 enhances their effectiveness due to its high surface area, thermal stability, and chemical resistance.

Environmental Catalysts: HfO2 thin films are sometimes used in environmental catalytic converters, helping to reduce harmful emissions by improving the efficiency of the catalyst in oxidizing pollutants in exhaust gases.

Energy Storage and Supercapacitors

Supercapacitors: Hafnium oxide is being explored in the development of supercapacitors and other energy storage devices. Due to its high dielectric constant, it can help improve the energy density and performance of capacitors. Sputtering HfO2 onto electrodes allows for the creation of high-performance energy storage devices that are capable of quick charging and discharging, especially for high-power applications.

Medical and Biotechnological Applications

Biocompatible Coatings: Hafnium oxide is sometimes used as a coating for medical implants, such as prosthetics or dental implants, where its corrosion resistance and biocompatibility are beneficial. Its ability to withstand harsh body environments makes it ideal for improving the longevity and functionality of medical devices.

Radiation Protection: In certain specialized medical applications,HfO2 is used as a radiation shielding material due to its ability to absorb neutrons and other types of radiation.
99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating

Available for COA( Certificate of Analysis)

99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
Changsha Xinkang Advanced Materials Co., Ltd (XK) is an international company involved in the R & D, manufacturing, and sales of many types of high-tech materials. We provide high-purity  materials, customized alloys, compounds, and almost every kind of complicated synthetic materials to research institutes and high-tech enterprises worldwide. We have significant advantages in high-purity metals, high-purity compounds, rare-earth metals, powder materirals, coated substrates, along with many other materials.ASTM/B ASME SB, AMS, DIN, JIS and other requirements fromcustomers. And these products have been widely used in the petrochemical industry, aerospace and aviation, shipbuilding, energy, medical,
military, electronics, environmental protection, machinery and instruments, metallurgy, automotive and
other fields.
Our factory is located in Changsha, Hunan, which covers an area of 4000 square meters. It has been certificated with IS09001:2015 quality management system and IS014001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore,India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Regardless of the order volume and size, we will try our best to meet your requirements and we are doing this for years99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating

99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating
Standard export packaging: Vacuum sealed package inside; export carton or wooden case outside
Shipment can be made by Fedex, DHL, UPS, TNT express etc.
for gross weight ≤100KG; For large shipment ≥100KG , shipping method will be discussed with you.
99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating99.9% Hafnium Oxide Ceramic Sputtering Target Hfo2 Disc for Vacuum Coating

1.Are you trading company or manufacturer?

 Xinkang:We are a professional manufacturer specialized in this field for over 10 years.

 
2.How long is your delivery time?

 XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity.

 

3.Do you have MOQ?

XinKang:No,We support samples.

 

4.What is your payment method?

 XinKang:T/T in advance, Paypal, Western Union and etc.

 

 

Welcome to contact us at any time!

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