Customization: | Available |
---|---|
Type: | Ceramic Target |
Shape: | Round |
Suppliers with verified business licenses
Audited by an independent third-party inspection agency
Product Name | ZnO sputtering target |
Available Purity | 99.9%min,as you request |
Available shape | round, rectangular,pellets |
Size | 1''- 8''mm,As per your request |
Technolgy | powder metallurgy |
Quotation | We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation) |
Application | Gate Dielectric Film,Vaccum coating,Process,Decoration,LED,Semi, |
Related products | AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. |
ZnO Target is a crucial component in various industries, known for its versatility and durability. It plays a significant role in enhancing the performance of electronic devices and solar panels. The key point to remember when using ZnO Target is to handle it with care and precision to ensure optimal results. By understanding its properties and following proper procedures, users can maximize its potential and achieve desired outcomes. It is important to stay informed about the latest advancements and techniques in utilizing ZnO Target effectively. With the right knowledge and approach, ZnO Target can be a valuable asset in achieving success in various applications.
Hot pressing and sintering process: raw materials → pretreatment → mold loading → hot pressing and sintering → machining → (binding) → inspection/defect detection → cleaning and packaging → transportation
Target Specifications
Diameter: D25.4mm, D50mm, D50.8mm, D60mm, D76.2mm, D80mm, D101.6mm, D100mm or customized
Thickness: 3mm, 4mm, 5mm, 6mm, 6.35mm can also be bound with copper backplane
Target preparation method
We typically produce metal and alloy targets by vacuum melting or hot isostatic pressing (HIP), while hot press sintering is used for ceramic targets. We choose the appropriate production process to manufacture products to meet your specific application requirements.
Application
Widely used in thin film optical coating, anti-reflection coating, semiconductor electronic coating, LCD, thin film solar energy, etc.
Related Ceramic Sputtering Materials
1.Are you trading company or manufacturer?
Xinkang:We are a professional manufacturer specialized in this field for over 10 years.
2.How long is your delivery time?
XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity.
3.Do you have MOQ?
XinKang:No,We support samples.
4.What is your payment method?
XinKang:T/T in advance, Paypal, Western Union and etc.
Welcome to contact us at any time!