| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Certification: | TUV, ISO, CE |
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| Product: | CuMnNi sputtering target |
| Purity: | 99.9% |
| Size: | customized |
| Shape: | Planar |
| Technology: | Powder Metallurgy |
| Packing: | Vacumm sealed, wooden case |
Features
Chemical Composition: copper manganese nickel target
Available Purity: 3N
Production Technology: Powder Metallurgy
Shapes: planar targets
Available size: round target, diameter ≤ 14", rectangle target, according to your requirement,
Indium bonding is recommended for this materials
Advantages: uniform color, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants.
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
OUR PRODUCTS
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