| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Shape: | Square |
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Our Cobalt Tantalum Zirconium Sputtering Target, crafted through cutting-edge melting technology, is meticulously engineered for the magnetic data storage industry. Boasting an impressive purity of up to 3N5, this target ensures uniform grain size and reduced oxygen content, enabling end-users to achieve consistent erosion rates. Experience the unparalleled high purity and homogeneity in thin film coatings during the PVD process, ensuring superior performance and reliability.
Key Features
Chemical Composition Details: CoTaZr 90/5/5at%, CoTaZr91.5/4.5/4at% - carefully balanced to optimize performance.
Weight Segregation Precision: +/-0.5wt% - ensuring each target meets the highest standards of consistency.
Available Purity Level: 3N5 - offering exceptional quality and enhanced results.
State-of-the-Art Production Technology: melting - ensuring integrity and precision in every target.
Shapes Offered: planar targets - designed for seamless integration into your applications.
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