• 99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
  • 99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
  • 99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
  • 99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
  • 99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
  • 99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering

99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering

Type: Metal Target
Shape: Plate
Certification: TUV, ISO, CE
Purity: 99.9%-99.9999%
Size: D50.8X3mm or as Your Request
OEM: Support
Customization:
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Overview

Basic Info.

Model NO.
XK-Cu
MOQ
1PCS
Materials
Pure Metal Copper
Application
PVD Film Coating
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Copper Target
Trademark
XinKang
Origin
China
HS Code
7402000090
Production Capacity
10000PCS/Month

Product Description

99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
Product Description

XinKang Factory Supply: Elite 4N 99.99% High Purity Cuprum/Cu/Copper Planar Target for PVD Coating and Evaporation Materials - Premier Copper Target
Name Metal Copper Sputtering Target (Cu Target)
Material Copper Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,
Size D50.8x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 8.954g/cm3
Melting Point 1083°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

In-Depth Description:

Our copper sputtering target mirrors the exceptional properties of metallic copper (Cu). Copper, denoted by the symbol Cu (from Latin: cuprum) and atomic number 29, is renowned for its softness, malleability, and ductility. This metal boasts remarkable thermal and electrical conductivity. When freshly exposed, pure copper exhibits a captivating pinkish-orange hue. Copper is indispensable as a conductor of heat and electricity, a robust building material, and a key component in diverse metal alloys. Produced through precise melting technology, our Copper Sputtering Target is extensively utilized in semiconductor industries, decorative coatings, and advanced packaging solutions.

We specialize in producing copper sputtering targets with an unparalleled purity range of 99.9% to an astounding 99.9999%, featuring an exceptionally low oxygen content of <1ppm. These targets are primarily employed in the manufacturing of display and touch screen wiring, protective films, solar light-absorbing layers, and semiconductor wiring. Our production capabilities include both planar copper sputtering targets (up to the maximum G8.5 generation) and copper rotary targets, particularly vital for the touch screen industry. To ensure a fine and uniform microstructure, we meticulously process with significant deformation and control twin growth. This precision results in a lower erosion rate and reduces the sensitivity to particle formation during sputtering, ensuring superior performance.
Product Parameters

99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
Application:
Preparation process of copper sputtering target
Material Preparation: A Journey from Purity to Precision - Electrolytic Purification & Electron Beam Melting - Chemical Analysis - Forging - Rolling - Annealing - Metallographic Inspection - Machining - Dimensional Inspection - Cleaning - Final Inspection - Packaging

Copper Sputtering Target and Its Advanced Preparation Method
Purification Process: Achieving Unparalleled Purity The copper undergoes multiple electrolysis and regional smelting processes to elevate its purity from 99.95% to an astounding 99.9999% (6N), the highest in China. Starting with high-purity copper ingots, we employ forging, rolling, and heat treatment to refine the crystal grains, enhancing density to perfectly suit sputtering target requirements. Post-deformation, the high-purity copper undergoes precise mechanical processing, ensuring meticulous target size and exceptional surface quality, ready for vacuum coating applications.

Diverse Alloy Forms for Specialized Applications
Our portfolio includes tin-copper, ***-copper, tungsten-copper, silver-copper, copper-phosphorus, nickel-copper alloy targets, and more.

Related Products:
99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd. stands as a beacon of excellence in the realm of metal materials. As a specialized factory, we excel in the research, development, production, processing, sales, and service of an extensive range of metal products. Our diverse portfolio includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and a variety of bespoke metal items. Adhering to stringent standards such as GB/T, ASTM/B, ASME SB, AMS, DIN, and JIS, our products meet the highest expectations of our discerning clientele. Expanding across a wide array of industries, our offerings have become indispensable in petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive sectors. Nestled in the heart of Changsha, Hunan, our state-of-the-art facility spans 4,000 square meters and is certified with ISO9001:2015 for quality management and ISO14001:2015 for environmental management. Our factory boasts cutting-edge technology and a skilled workforce dedicated to excellence. We utilize advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure impeccable quality. Our commitment to quality is reflected in our robust exports to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Our reputation for superior quality, competitive pricing, punctual delivery, and exceptional after-sales service has garnered us widespread acclaim from our global customers.
99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
Certifications

99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
Factory and Equippments

99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
Packaging & Shipping

99.9999% Pure Copper Plate C10100 C11000 C12000 for Magnetron Sputtering
FAQ

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