• Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
  • Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
  • Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
  • Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
  • Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
  • Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC

Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC

Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%
Type: Ceramic Plate
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Customization:
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Overview

Basic Info.

Model NO.
XK-LaB6
Materials
Lanthanum Hexaborid
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
2850000090
Production Capacity
10000PCS/Month

Product Description

Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
Product Description

XinKang Factory Supplies Premier Top-Ranking 99.9% Pure LaB6 Ceramic Target - Lanthanum Hexaborid for PVD Coating
Name Lanthanum Hexaborid Ceramic Sputtering Target / LaB6 ceramic targets
Material Lanthanum Hexaborid LaB6 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color Purple Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 4.7g/cm3
Melting Point 2715°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:LaB6, with its B6 octahedral network, requires two electrons to stabilize its structure. Among La's three valence electrons, one remains abundant, allowing LaB6 to act as a metallic conductor. The surface plasmon resonance absorption of LaB6 nanomaterial is around 1000nm, compensating for the limitations of infrared blocking materials like ITO (indium tin oxide) in the near-infrared region. This makes LaB6 a pivotal infrared blocking material. The strong covalent bonds between B atoms create a tight spatial network, endowing LaB6 with low volatility, low work function, high melting point, high strength, and exceptional stability. Consequently, it is a crucial material for field emission, widely utilized in advanced instruments like electron microscope filaments. Its density is 4.7g/cm^3. Among the various B-La compounds, such as LaB2 and LaB4, LaB6 is the most stable.
Lanthanum Hexaborid
Sputtering Target;
Purity: 99.9%;
Production Method: Cold Press Sintering;
Available Dimensions:
Circular Target: Diameter = 3 mm;
Rectangular Target: Length = 3 mm;
Rotary Target: L 4000 x Wall Thickness 15mm;
Minimal Order Quantity: 1 Piece;
Type of Bonding: Indium, Elastomer;
Application Field: Thin-film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Target
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
Discover the exceptional quality of our NiO sputtering target, designed for high-performance applications and unparalleled results.
Experience top-tier efficiency with our MoO3 sputtering target, crafted for optimal performance in advanced material processes.
Elevate your projects with our premium WO3 sputtering target, engineered for superior reliability and consistency.
Unlock the potential of your applications with our high-grade LiFePO4 sputtering target, ensuring excellence in every use.
Choose our ZnS sputtering target for exceptional quality and outstanding performance in your advanced material needs.
Discover the high-quality Bi2Te3 sputtering target, designed to deliver superior performance in specialized applications.
Achieve unparalleled results with our Ga2O3 sputtering target, meticulously crafted for high-precision applications.
Rely on our In2O3 sputtering target for exceptional quality, tailored for cutting-edge material science applications.
Choose our Ta2O5 sputtering target for top-notch performance and reliability in your advanced material processes.
Opt for our Nb2O5 sputtering target, designed to provide exceptional quality and performance in specialized applications.
Product Parameters

Superior Lanthanum Hexaborid Sputtering Target
/ LaB6 Ceramic Targets – Certificate of Analysis (COA)
Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
Innovative Application Areas:
1. Enhance and sustain the surface properties of materials, ensuring improved hardness, exceptional wear resistance, and superior corrosion resistance.
2. Essential in the development of cutting-edge materials or the enhancement of existing ones, including solar cells, advanced LEDs, and state-of-the-art flat panel displays.
3. Integral to the creation of electronic components like transistors and sophisticated integrated circuits.
4. Crucial for producing high-performance superconductors, advanced optical films, sensitive sensors, and a variety of other specialized materials.

Explore Our Related High-Quality Products:
Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PCLanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier factory specializing in the research, development, production, processing, sales, and service of high-quality metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and other customized metal items. We adhere to the stringent standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and custom requirements from our clients, ensuring top-notch quality across all our offerings. These products find wide applications in industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our state-of-the-art factory, spanning 4000 square meters, is situated in Changsha, Hunan, and is certified with ISO9001:2015 and ISO14001:2015 management systems. Equipped with cutting-edge technology and a highly skilled team of technicians, we employ advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure superior product quality. Our commitment to excellence, competitive pricing, timely delivery, and unparalleled after-sales service have earned us a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Join us in experiencing the finest in metal materials and services.
Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
Certifications

Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
Factory and Equippments

Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
Packaging & Shipping

Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC
FAQ

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Management System Certification
ISO 9001, ISO 14001