XinKang Factory offers unparalleled excellence with its top-tier 99.9% Pure LaB6 Ceramic Target, Lanthanum Hexaborid Target tailored for PVD Coating needs.
Description:Lanthanum Hexaborid (LaB6) stands out due to its unique B6 octahedral network, stabilized by La's three valence electrons, resulting in exceptional metallic conductivity. Its surface plasmon resonance absorption around 1000nm effectively addresses the limitations of near-infrared blocking materials like ITO, making LaB6 a pivotal material for infrared blocking. The robust covalent bonds between B atoms create a dense spatial network, endowing LaB6 with low volatility, low work function, high melting point, extraordinary strength, and remarkable stability. Consequently, it is widely utilized in cutting-edge instruments such as electron microscope filaments. Its density stands at 4.7g/cm^3. Among the various B-La compounds, including LaB2 and LaB4, LaB6 remains the most stable, further enhancing its significance in advanced applications.
Lanthanum Hexaborid
Sputtering Target;
Purity: 99.9%;
Production Method: cold press sintering;
Available dimensions:
Circular target: Diameter = 3 mm;
Rectangular target: Length = 3 mm;
Rotary target: L 4000 x Wall thickness 15mm;
Minimal order quantity: 1 piece;
Type of Bonding: Indium, Elastomer;
Application field: Thin-film Photovoltaic industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Other related targets: Aluminum Oxide (Al2O3) sputtering target
Aluminum Zinc Oxide (AZO) sputtering target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) sputtering target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
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Al2O3 sputtering target
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Co2O3 sputtering target
AlN sputtering target
ITO sputtering target
VO2 sputtering target
SiO2 sputtering target
Fe2O3 sputtering target
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SnO2 sputtering target
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NiO Sputtering Target: Elevate your thin-film deposition processes with our high-quality Nickel Oxide sputtering target, designed for impeccable performance and superior coating results.
MoO3 Sputtering Target: Experience unparalleled efficiency in your Physical Vapor Deposition (PVD) applications with our premium Molybdenum Trioxide sputtering target, ensuring consistent and high-purity coatings.
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LiFePO4 Sputtering Target: Enhance your energy storage solutions with our top-tier Lithium Iron Phosphate sputtering target, optimally crafted for superior performance and longevity.
ZnS Sputtering Target: Discover the exceptional quality of our Zinc Sulfide sputtering target, perfect for high-efficiency thin-film deposition and superior coating uniformity.
Bi2Te3 Sputtering Target: Revolutionize your thermoelectric material applications with our Bismuth Telluride sputtering target, designed for exceptional performance and stability in thin-film coatings.
Ga2O3 Sputtering Target: Maximize your optoelectronic applications with our Gallium Oxide sputtering target, delivering high-purity coatings and exceptional deposition consistency.
In2O3 Sputtering Target: Optimize your transparent conductive oxide layers with our premium Indium Oxide sputtering target, ensuring high-efficiency and reliable thin-film deposition.
Ta2O5 Sputtering Target: Achieve superior dielectric and optical coatings with our Tantalum Pentoxide sputtering target, renowned for its excellent performance and high-purity results.
Nb2O5 Sputtering Target: Enhance your PVD applications with our Niobium Pentoxide sputtering target, meticulously designed for consistent, high-quality thin-film coatings.
Lanthanum Hexaborid Sputtering Target
/ LaB6 Ceramic Targets COA
Application:
1. Enhance and elevate the surface properties of materials, including hardness, wear resistance, and corrosion resistance, ensuring superior durability and longevity;
2. Ideal for the creation of new materials or the enhancement of existing materials' performance, suitable for industries such as solar cells, LEDs, and flat-panel displays;
3. Essential in the fabrication of electronic components, including transistors, integrated circuits, and more, ensuring top-notch functionality and reliability;
4. Crucial for the development of superconductors, optical films, sensors, and a variety of other advanced materials.
Related Products:
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd stands as a beacon of innovation and quality in the realm of high-grade metal materials. As a leading factory, we specialize in the comprehensive spectrum of research, development, production, processing, sales, and service. Our diverse product portfolio includes premium metal elements, alloys, sputtering targets, ceramic targets, evaporation materials, metal powders, alloy powders, and various bespoke metal creations. Upholding the rigorous standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, along with tailor-made specifications, we guarantee unparalleled excellence in every product. Our offerings are integral to vital industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive sectors. Nestled in Changsha, Hunan, our cutting-edge factory spans 4000 square meters and meets the stringent ISO9001:2015 and ISO14001:2015 management certifications. Powered by advanced technology and a team of expert technicians, we utilize sophisticated testing instruments like carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure exceptional product quality. Our relentless dedication to excellence, competitive pricing, prompt delivery, and outstanding after-sales support have forged strong bonds with clients across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Discover the pinnacle of metal materials and service with Changsha XinKang Advanced Materials Co., Ltd.
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