• Vanadium Alloy Round Target for Magnetron Sputtering
  • Vanadium Alloy Round Target for Magnetron Sputtering
  • Vanadium Alloy Round Target for Magnetron Sputtering
  • Vanadium Alloy Round Target for Magnetron Sputtering
  • Vanadium Alloy Round Target for Magnetron Sputtering
  • Vanadium Alloy Round Target for Magnetron Sputtering

Vanadium Alloy Round Target for Magnetron Sputtering

Type: Alloy Target
Shape: Round
Purity: 99.9%-99.9995%
Size: D50.8X3mm or as Your Request
OEM: Support
MOQ: 1PCS
Customization:
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  • Product Description
  • Product Parameters
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  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-NiV
Materials
Pure Metal Nickel + Vanadium
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Nickel Vanadium Sputtering Targets
Trademark
XinKang
Origin
China
HS Code
7505110000
Production Capacity
10000PCS/Month

Product Description

Vanadium Alloy Round Target for Magnetron Sputtering
Product Description

XinKang Factory Supply Top Ranking 99.9%-99.995% Purity NiV Magnetron Nickel Vanadium Sputtering Target NiV7wt% for PVD Coating
Name Metal Nickel Vanadium Alloy Sputtering Targets  (NiV7 Targets)
Material Nickel Vanadium Alloy Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5.
Size D50.8x3mm, 10x10x10mm,D3x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density Ni: 8.902g/cm3 ;  V:6.11g/cm3
Melting Point Ni: 1453°C; V: 1890°C.
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Nickel, a lustrous silver-white metal, boasts excellent mechanical strength and ductility. It is insoluble in water and exhibits formidable resistance to both acids and alkalis. With a high melting point of 1455 °C and a boiling point of 2730 °C, nickel's density is 8.902g/cm³. Renowned for its versatility, nickel finds applications in currency production and as a rust-preventative electroplating material on various metals.

Our high-purity NiV sputtering targets are meticulously crafted to ensure your films achieve exceptional electrical conductivity while minimizing particle formation during the PVD process. The following table provides a typical certificate of analysis for our 3N5 high purity NiV(93/7wt%) sputtering target, underscoring our commitment to quality and precision.
Product Parameters

Vanadium Alloy Round Target for Magnetron Sputtering
Application:

Renowned for its exceptional plasticity, corrosion resistance, and magnetic properties, Nickel is primarily utilized in the domains of steel production, nickel-based alloys, electroplating, and battery manufacturing. Its versatility extends to various military manufacturing industries, including aircraft and radar, as well as civil machinery manufacturing and the electroplating industry.

In the intricate fabrication of integrated circuits, pure gold is typically employed as an interconnect metal, meticulously deposited on silicon wafers. However, gold's tendency to diffuse into the silicon wafer forms a high-resistance AuSi compound, significantly diminishing the current density in the wiring, ultimately leading to the breakdown of the entire wiring system.
To combat this, it is advisable to incorporate an adhesive layer between the gold thin film and silicon wafers. This layer is generally composed of pure nickel, but diffusion also occurs between the nickel layer and the gold conductive layer. Consequently, a barrier layer is essential to prevent this diffusion, ensuring the integrity of the gold conductive and nickel adhesive layers.
Thanks to its high melting point and substantial current density, vanadium is the material of choice for depositing the barrier layer. Thus, nickel sputtering targets, vanadium sputtering targets, and gold sputtering targets are all indispensable in the fabrication of integrated circuits.
Nickel vanadium (NiV) sputtering targets, which contain 7% vanadium, combine the strengths of both nickel and vanadium. This unique alloy enables the simultaneous creation of adhesive and barrier layers. Additionally, the non-magnetic nature of the NiV alloy enhances its suitability for magnetron sputtering processes.

Related Products:
Vanadium Alloy Round Target for Magnetron SputteringVanadium Alloy Round Target for Magnetron Sputtering
Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a professional factory specialized in the research, development, production, processing, sales and service of metal materials.Including: Metal elements, Alloy,metal sputtering targets, alloy targets,ceramic targets,evaporation materials, Metal powder,alloy powder,and other customized metal items. We process our products according to the standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS and other requirements from customers. And these products have been widely used in the petrochemical industry, aerospace and aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive and other fields. Our factory is located in Changsha, Hunan, which covers an area of 4000 square meters. It has been certificated with ISO9001:2015 quality management system and ISO14001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore, India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Vanadium Alloy Round Target for Magnetron Sputtering
Certifications

Vanadium Alloy Round Target for Magnetron Sputtering
Factory and Equippments

Vanadium Alloy Round Target for Magnetron Sputtering
Packaging & Shipping

Vanadium Alloy Round Target for Magnetron Sputtering
FAQ

1. Are you a trading company or a manufacturer?

Xinkang: We are a distinguished manufacturer with over a decade of dedicated expertise in this industry.


2. What is your delivery time?

Xinkang: For regular sizes or samples, we guarantee shipment within 3-5 days. For batch quantities, the delivery time is 15 days.

3. Do you have a minimum order quantity (MOQ)?

Xinkang: No, we fully support sample orders.

4. What are your payment methods?

Xinkang: We accept T/T in advance, PayPal, Western Union, and other methods.

Feel free to contact us at any time! We are here to assist you.

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