Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating

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Customization: Available
Condition: New
Certification: RoHS, ISO9001

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  • Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating
  • Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating
  • Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating
  • Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating
  • Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating
  • Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating
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  • Overview
  • Product Description
  • Company Information
  • FAQ
Overview

Basic Info.

Model NO.
XK-Ta
Customized
Customized
Material
Pure Tantalum
Application
Optical Thin Film Coating
CAS No
7440-25-7
Usage
PVD Film Coating
Shape
Round
Delivery Time
7-21days
Keywords
Metal Tantalum Materials
Size
as Request
Purity
99.9-99.95%
Chemical Composition
Ta
Appearance
Polished Surface
MOQ
1PC
Product Name
Tantalum Metal Targets
Package
Vacuum Blister
Transport Package
Vacuum Sealed Package Inside
Specification
customized
Trademark
XinKang
Origin
Hunan, China
Production Capacity
1000000 Piece/Pieces Per Month

Product Description

Product Description

 

Factory price High purity Refractory tantalum Planar target 3N5 99.95% Pure tantalum sputtering target for pvd coating

Name Metal Tantalum Ta magnetron sputtering target 
Purity 99.9%-99.995%
Size 372x74x6mm, D3x3mm,D6x6mm,D50.8x3mm, 2inch,3inch, As request
Boiling Point 54257
Density 16.654g/cm³
Melting Point 2996.0
Shape Planar target, Rotary target,Arc Cathode.
MOQ 1PCS
Application Evaporation materials, PVD Film Coating and etc

Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating

Tantalum, a metallic element, occurring chiefly in tantalite and associated with niobium. Tantalum has moderate hardness and good ductility, and can be drawn into thin wire foil. It's a small Coefficient of thermal expansion. Tantalum has excellent chemical property and is highly resistant to corrosion. Although tantalum is highly resistant to corrosion, its resistance to corrosion is due to the formation of a stable tantalum pentoxide (TA2O5) protective film on its surface. It does not react with hydrochloric acid, concentrated nitric acid or"Aqua regia" under both cold and hot conditions. It can be used to make evaporator and so on. It can also be used as electrode of electron tube, rectifier and electrolytic capacitor. Used medically to make sheets or threads to sew up damaged tissue.

 

Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating

Capacitors are the most important use of tantalum.

Tantalum is also used to make electron emission tubes and high-power electron tube parts. Tantalum corrosion-resistant equipment is used in the production of strong acid, bromine, ammonia and other chemical industries.

Tantalum can be used as a structural material for the combustor of aircraft engines. Tantalum-tungsten, tantalum-tungsten-hafnium and tantalum-hafnium alloys are used as heat-resistant and high-strength materials for rockets, missiles and jet engine, and as components in control and conditioning equipment.

Tantalum is easy to be machined and shaped. It is used as supporting accessory, heat shield, heater and heat sink in high temperature vacuum furnace.

Tantalum can be used as orthopaedic and surgical materials.

Tantalum carbide is used to make cemented carbide.

Tantalum boride, silicide, nitride and their alloys are used as heat release elements and liquid metal cladding materials in the atomic energy industry.

Tantalum oxide is used in the manufacture of advanced optical glasses and catalysts.

 

Application: Tantalum Sputtering Targets

Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating

Other Related Sputtering Targets

Metal Target  Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets
Alloy Target Ni,Fe,Co,Cu,Al alloy. and special alloy 
Evaporation Materials Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc
Ceramic Targets Oxide Ceramic, Compound ceramic targets.
    Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating
Company Information

 Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating

Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating

Refractory Tantalum Planar Target 3n5 99.95% Pure Tantalum Sputtering Target for PVD Coating

FAQ

 

1. Are you trading company or manufacturer ?
Xinkang: We are a professional manufacturer specialized in this field for over 10 years.

 

2: How long is your delivery time?
Xinkang: Shipment can be made in 5-7 days for those regular size, or samples , and 15-20 days for batch quantity. 
 
3: Do you have MOQ ? 
Xinkang: No, we support samples.

 

4: What is your payment method?
Xinkang: T/T in advance, Paypal , Western Union and etc.

 

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