OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material

Product Details
Customization: Available
Application: Aerospace, Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%

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  • OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
  • OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
  • OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
  • OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
  • OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
  • OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
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  • Overview
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  • Product Parameters
  • Company Profile
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Overview

Basic Info.

Model NO.
XK-CrN
Materials
Chromium Nitride
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
1-10mm
Trademark
XinKang
Origin
China
HS Code
3824999999
Production Capacity
10000PCS/Month

Product Description

OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
Product Description

Introducing the XinKang Factory's premium Chromium Nitride particles. Our 1-10mm 99.5% CrN Granules are engineered for high hardness and exceptional wear resistance, making them the ideal choice for demanding industrial applications.
Name Chromium Nitride Ceramic Evaporation Materials / CrN Ceramic Pellets
Material Chromium Nitride CrN Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size 1-10mm, 2inch,3inch,Or As Request
Color Gray Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 6.14g/cm3
Melting Point 1282°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Product Description:

Feature:

CrN is a cubic crystal with a lattice constant a=0.4150nm, a relative density of 6.14, and a melting point of 1282°C (decomposition). It boasts a volume resistivity of 640 µΩ.cm, a thermal conductivity of 11.7 W/(m·K), and a microhardness of 1090 kg/mm². Cr2N is a hexagonal crystal, gray in color, with a lattice constant a=0.274nm and a relative density of 6.8. Chromium nitride is insoluble in water and acid. At high temperatures, it forms a conductive solid solution with chromium carbide, featuring a volume resistivity of about 10-zn µΩ.cm. This material offers excellent adhesion, corrosion resistance, and oxidation resistance.

Preparation Method

Low-carbon ferrochromium is nitrided in a vacuum heating furnace at 1150°C to produce crude ferrochromium nitride. This is then treated with sulfuric acid to remove iron impurities, followed by filtering, washing, and drying to obtain high-purity chromium nitride. Alternatively, chromium nitride can be synthesized through the reaction of ammonia with chromium halide.

Use

Chromium nitride is utilized as a wear-resistant coating. It is added to mechanical parts and molds to enhance their lubricity and wear resistance. Its high surface hardness, low friction coefficient, and reduced residual stress make it suitable for applications involving anti-wear and metal-to-metal friction.

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Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
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Aluminum Oxide (Al2O3) Sputtering Target
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Aluminum Nitride (AlN) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Target
Vanadium Dioxide (VO2) Sputtering Target
Silicon Dioxide (SiO2) Sputtering Target
Iron Oxide (Fe2O3) Sputtering Target
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Product Parameters


/ Comprehensive CrN Ceramic Targets Certificate of Analysis (COA)
OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
Diverse Applications:
1. Elevate the excellence of surface properties by significantly enhancing hardness, wear resistance, and corrosion resistance, ensuring superior material performance.
2. Essential for the innovation of pioneering materials, our SiO2 ceramic materials play a pivotal role in solar cells, LEDs, flat panel displays, and numerous other advanced applications.
3. Crucial to crafting high-performance electronic components like transistors and integrated circuits, our high-purity SiO2 ceramic materials ensure unmatched performance and reliability.
4. Vital for the advancement of superconductors, optical films, sensors, and a wide range of advanced materials, driving the cutting edge of technological innovation.

Explore Our Related Products:
OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering MaterialOEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Established in 2014, Changsha Xinkang Advanced Materials Co., Ltd. has swiftly risen to prominence as a trailblazer in the domain of premium metal materials. Our expertise spans across exhaustive research, innovative development, meticulous production, and processing, coupled with unmatched sales and customer support. Our extensive product portfolio includes metal elements, alloys, sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and custom metal goods. We rigorously adhere to stringent standards including GB/T, ASTM/B, ASME SB, AMS, DIN, and JIS, as well as bespoke client specifications to ensure our products meet the pinnacle of quality. These superior materials serve vital roles in diverse industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive sectors. Our cutting-edge factory spans over 4000 square meters in Changsha, Hunan, and is certified with ISO9001:2015 and ISO14001:2015. Armed with advanced technological resources and a team of elite technicians, we deploy state-of-the-art testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure unmatched product quality. Our unwavering dedication to perfection, competitive pricing, timely delivery, and stellar after-sales service have earned us a devoted clientele across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Experience the zenith of metal materials and exceptional services with us.
OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
Certifications

OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
Factory and Equippments

OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
Packaging & Shipping

OEM Support for High Quality Chromium Nitride 99.99% Crn Target Sputtering Material
FAQ

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