Mo Metal Material Molybdenum Sputtering Target for PVD Coating Machine

Type: Metal Target
Certification: TUV, ISO, CE
Purity: 99.95%
Size: Customized
MOQ: 1 PC
Free Sample: Accept
Customization:

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Basic Info.

Model NO.
XK-Mo
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

                  Thin film coating materials molybdenum/Mo sputtering target 

       Molybdenum Sputtering Target are produced by powder metallurgy technology, as a refractory metal, it has very high melting point, as well as high electrical conductivity, good corrosion resistance and environment friendly, it's widely used for field of TFT-LCD, thin film solar cells and semiconductor fields. With up to 3N5 purity, high density, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
 
Product: molybdenum/Mo sputtering target
Purity:  99.95%
Size:  customized
Shape:  Planar and rotary
Packing:  Vacumm sealed, wooden case
     

                                         
                                                          PRODUCTION PROCESS


 

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Management System Certification
ISO 9001, ISO 14001