99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering

Product Details
Customization: Available
Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%

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  • 99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
  • 99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
  • 99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
  • 99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
  • 99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
  • 99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-SiO2
Size
1inch 2inch 3inch or as Your Request
OEM
Support
MOQ
1PC
Materials
Silicon Dioxide
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3824999999
Production Capacity
10000PCS/Month

Product Description

99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
Product Description

XinKang Factory 99.995% Purity SiO2 Planar Sputtering Target, Silicon Dioxide Ceramic Target for Coating
Name Silicon Dioxide Ceramic Sputtering Target / SiO2 Ceramic targets
Material Silicon Dioxide SiO2 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.2g/cm3
Melting Point 1723°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Silica, also known as silicon dioxide, bears the chemical formula SiO2.In nature, silica exists in two forms: crystalline silica and amorphous silica.SiO2 boasts a high melting point of 1723°C and a boiling point of 2230°C.Its refractive index is approximately 1.6.

Application Fields:
Widely utilized as analytical reagents, fluorophores, and photoconductor materials. It is pivotal in manufacturing dyes, coatings, pigments, glass, cured oil, and more. Additionally, it's essential for creating optical filters and laser window coatings.
Thin-Film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Silica is a fundamental material for producing glass, quartz glass, water glass, and optical fibers.It is an integral component in the electronic industry and optical instruments,also used in handicrafts and refractory materials, making it indispensable for scientific research.
Uses of silica include flat glass, glass products, foundry sand, glass fiber, ceramic glaze, anti-rust sand blasting,filter sand, flux, refractory materials, and the production of lightweight bubble concrete (Autoclaved Lightweight Concrete).It's crucial for manufacturing key components, optical instruments, and handicrafts in the electronics industry.An essential raw material for optical fibers, silica can also be used to produce quartz glass and high-temperature chemical instruments.Commonly, quartz sand is utilized as a raw material for glass and building materials.

Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
Premium NiO Sputtering Target - Designed for Superior Performance: Elevate your product development with our high-quality Nickel Oxide target, meticulously crafted to deliver unparalleled performance and consistency in every application.
High-Quality MoO3 Sputtering Target - Engineered for Precision: Experience the finest in material engineering with our Molybdenum Trioxide target. It’s precision-engineered to meet the exacting standards of cutting-edge technology applications.
Exceptional WO3 Sputtering Target - Unmatched Consistency: Discover the reliability of our Tungsten Trioxide target, designed to provide exceptional consistency and superior performance for all your advanced sputtering needs.
Top-Tier LiFePO4 Sputtering Target - Reliable and Efficient: Trust in our Lithium Iron Phosphate target for your sputtering processes. It’s the top-tier choice for reliability and efficiency, ensuring optimal outcomes in every use.
Advanced ZnS Sputtering Target - Optimal for High-Performance Applications: Our Zinc Sulfide target is tailored for high-performance sputtering applications, ensuring optimal results and exceptional quality in every production cycle.
Superior Bi2Te3 Sputtering Target - Ideal for Cutting-Edge Technologies: Achieve superior results with our Bismuth Telluride target, designed specifically for the demands of cutting-edge technologies and innovative applications.
Premium Ga2O3 Sputtering Target - Engineered for Excellence: Our Gallium Oxide target stands out for its premium quality and engineering excellence, making it the perfect choice for achieving top-tier performance in your projects.
High-Grade In2O3 Sputtering Target - Consistent and Reliable: Rely on our Indium Oxide target for its high-grade consistency and reliability, enhancing the precision and efficiency of your advanced sputtering applications.
Top-Quality Ta2O5 Sputtering Target - Perfect for Precision Applications: Choose our Tantalum Pentoxide target for top-quality results. Perfectly suited for precision applications, it ensures superior performance and exceptional durability.
Exceptional Nb2O5 Sputtering Target - Designed for Durability and Performance: Our Niobium Pentoxide target sets the standard for durability and performance, making it an exceptional choice for your advanced sputtering processes.
Product Parameters


/ SiO2 Ceramic Targets Certificate of Analysis (COA)
99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
Application:
1. Enhance and preserve the surface attributes of materials, elevating their hardness, wear resistance, corrosion resistance, and more.
2. Crucial for the creation of cutting-edge materials and the enhancement of existing ones, our ceramic targets find applications in solar cells, LEDs, flat panel displays, and beyond.
3. Essential in the fabrication of high-performance electronic components, including transistors and integrated circuits.
4. Vital for the development of superconductors, optical films, sensors, and a variety of advanced materials, ensuring top-notch performance and reliability.

Related Products:
99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a renowned factory dedicated to the research, development, production, processing, sales, and service of premium metal materials. Our diverse product range encompasses metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and bespoke metal items. We adhere to the rigorous standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and cater to custom client requirements, guaranteeing exceptional quality in all our offerings. These products are extensively utilized across various industries, including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our cutting-edge factory, covering 4000 square meters, is located in Changsha, Hunan, and boasts ISO9001:2015 and ISO14001:2015 management system certifications. With state-of-the-art technology and a highly proficient team, we employ advanced testing instruments such as carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure unparalleled product quality. Our unwavering commitment to excellence, competitive pricing, prompt delivery, and unrivaled after-sales service have secured us a loyal clientele in the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Discover the pinnacle of metal materials and services with us.
99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
Certifications

99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
Factory and Equippments

99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
Packaging & Shipping

99.99% Pure Silicon Dioxide Ceramic Target for Precision Sputtering
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