• PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
  • PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
  • PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
  • PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
  • PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
  • PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering

PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering

Type: Ceramic Target
Shape: Round
Certification: TUV, ISO, CE
Purity: 99.9%
Size: Customized
MOQ: 1 PC
Customization:
Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory

Basic Info.

Model NO.
XK-YIG
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
Material
Y3fe5o12
Application
PVD Coating
Product
Yig Sputtering Target
Transport Package
Wooden Case Outside
Specification
customized
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

                                                                     Our Advantage
  
           Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target.

PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering

                                               
Our Quality Control System
PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering


                                                   Our Main Equipment

Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,

vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center, 

grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc
PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
                 

                                                    Our Certificates

1. We are an ISO9001 certified company.

2. We've been issued SGS Report.

3. We've been  awarded as a High-Tech Enterprise.

4. We've been invested by the National Fund for High-end Equipment. 

PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
                                                               Our Exhibition

We have been attended exhibitions in Korea, Japan, USA, German, etc.
PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
                                                          
  Application

Magnetic data storage/ Solar photovoltaic/ Glass coating 

Semi-conductor/ Flat panel display/ Decoration coating
PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
                                                         
                                                         
Our Products

We can also produce other metal sputtering targets, evaporation materials, crucibles, compound sputtering targets, etc.

We warmly welcome our dear customers from all around the world with OEM&ODM service.
PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering
                                                                       
                                                             
Our Team

 1. We've been providing high-quality products & service for many years. 

2. The factory covers an area of 2,000 square meter.

3. We have over 30 employees, including a group of experts in non-ferrous industry. 

4. We have a professional team foreign trade. 
PVD Target Y3fe5o12 Compound Target Yig Sputter Target for Sputtering

                                                                                

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now

You Might Also Like

Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001