• Tantalum Plate Sputtering Target for Magnetron Coating
  • Tantalum Plate Sputtering Target for Magnetron Coating
  • Tantalum Plate Sputtering Target for Magnetron Coating
  • Tantalum Plate Sputtering Target for Magnetron Coating
  • Tantalum Plate Sputtering Target for Magnetron Coating
  • Tantalum Plate Sputtering Target for Magnetron Coating

Tantalum Plate Sputtering Target for Magnetron Coating

Type: Metal Target
Shape: Rectangle
Certification: TUV, ISO, CE
Purity: 99.95%-99.99%
Material: Tantalum
Size: Customized
Customization:
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Manufacturer/Factory

Basic Info.

Model NO.
XK-Ta
Application
Glass/Metal/Plastic/Ceramic Coating
MOQ
1 PC
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
Transport Package
Wooden Case
Specification
any size
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

Tantalum/Ta sputtering target features:

Chemical Composition: pure Ta

Available Purity: 3N5, 4N

Production Technology: EB Melting

Shapes: planar targets

Average Grain Size: < 100um


Tantalum Sputtering Target is produced by EB melting. It's usually applied for magnetic recording media, printer components, flat panel displays, optic, industrial glass, and thin film resistors. High purity Tantalum Sputtering Target is normally used for semiconductor application. Tantalum's high natural strength with its low thermal expansion coefficient, together with its ability to stick to both copper and silicon make it the perfect choice for a diffusion barrier to prevent copper and silicon from interacting. With up to 4N5 purity, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Tantalum Plate Sputtering Target for Magnetron Coating

Company Profile:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
Tantalum Plate Sputtering Target for Magnetron CoatingTantalum Plate Sputtering Target for Magnetron Coating

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer       
 Tantalum Plate Sputtering Target for Magnetron Coating                                     
 OUR ADVANTAGE


1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm                                                   
Tantalum Plate Sputtering Target for Magnetron Coating

PACKING & DELIVERY
 
Packaging Detail:
Inside: drying agent and vacuum sealed to prevent oxidization
Outside: wooden case to avoid damage during transportation

 
Delivery Detail: Within 3-15 working days .
DHL, FedEx, UPS door to door service, 5-7 days from China to your country.
 
Tantalum Plate Sputtering Target for Magnetron Coating
OUR CERTIFICATE
Tantalum Plate Sputtering Target for Magnetron CoatingTantalum Plate Sputtering Target for Magnetron Coating



 

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Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001