• Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
  • Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
  • Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
  • Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
  • Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
  • Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size

Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size

Application: Medical, Industrial, Electronics, Aviation, PVD Film Coating
Purity: 99.9%-99.9995%
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Materials: Al2O3
Customization:
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Overview

Basic Info.

Model NO.
XK-Al2O3
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Alumina Target D50.8mm
Trademark
XinKang
Origin
China
HS Code
7606910000
Production Capacity
10000PCS/Month

Product Description

Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
Product Description
 
XinKang Factory Supply Top Ranking 99.99%Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
Name Aluminium Oxide Ceramic Sputtering Target (Al2O3 Ceramic Targets)
Material Aluminium Oxide Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.7g/cm3
Melting Point 660°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)
 
Description:

Aluminum is a silvery white light metal, renowned for its malleability. Often crafted into rods, sheets, foil, powders, strips, and filaments, it forms a protective oxide film in moist air to prevent corrosion. When heated in the air, aluminum powder and foil burn intensely, emitting a brilliant white flame. Soluble in dilute acids and alkalis but insoluble in water, aluminum boasts a relative density of 2.70, a melting point of 660 ° C, and a boiling point of 2327 ° C. Its remarkable properties, including light weight, excellent electrical and thermal conductivity, high reflectivity, and oxidation resistance, make it an indispensable material across various industries.

Aluminum Pellets possess the same beneficial properties as metal aluminum. As a chemical element with the symbol Al and atomic number 13, aluminum is a silvery-white, soft, ductile metal in the boron group. Noteworthy for its low density and corrosion resistance via passivation, aluminum is non-magnetic and highly versatile.

Aluminum and its numerous alloys are of paramount importance in the aerospace sector and critical in transportation and construction industries, including building facades and window frames. Pure aluminum grades such as 3N8-4N8 are essential for rolling electrolytic capacitor aluminum foil, lighting fixtures, and data storage solutions. Ultra-pure grades like 5N-6N are vital for creating semiconductor devices, optoelectronic storage media fabrication, superconducting cable materials, and scientific research in space exploration.

Our high-purity sputtering targets offer unmatched benefits, ensuring your films achieve exceptional electrical conductivity and minimal particle formation during the PVD process. Below is a typical Certificate of Analysis for our 5N aluminum sputtering target, underscoring its high-purity standard and superior performance characteristics.
Product Parameters

Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
Application:

Application: This versatile material is ideal for a broad range of sputtering techniques including DC two-pole, three-pole, four-stage, RF, target-oriented, ion beam, and magnetron sputtering. Perfect for applying reflective, conductive, semiconductor, capacitor, decorative, and protective films, it is indispensable for integrated circuits and display technologies. The aluminum target material stands as the premier choice when functional film requirements are critical.

Aluminum is derived by extracting Al2O3 from bauxite and electrolyzing it in molten cryolite, achieving a purity level generally above 99%. However, this purity is insufficient for producing high-quality aluminum targets. The most critical requirement is exceptional purity. The high-purity aluminum used in these targets is manufactured through advanced techniques like segregation, three-layer electrolysis, or combined zone smelting, resulting in a significantly higher price compared to the industrial pure aluminum (99.7%). In China, the highest obtainable purity reaches up to 99.9999% (6N). Utilizing these high-purity aluminum ingots as raw materials, processes like forging, rolling, and heat treatment refine the grain structure and enhance density to meet the exacting standards of sputtering aluminum targets. Post-deformation, the aluminum undergoes precise mechanical processing. The production of aluminum targets demands high precision and superior surface quality, enabling customization to the target sizes required by vacuum coating machines.

Other Alloy Forms of Aluminum Sputtering Target
Include: Aluminum-Silicon, Aluminum-Copper, Aluminum-Magnesium, Aluminum-Zinc, and Aluminum-Rare Earth alloys.


Related Products:
Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized SizeAluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc
 
Company Profile
 
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd. stands as a distinguished leader in the realm of metal materials. Our expertise spans the research, development, production, processing, sales, and service of a diverse range of metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and other bespoke metal items. Our adherence to international standards such as GB/T, ASTM/B ASME SB, AMS, DIN, JIS, and customer-specific requirements ensures unparalleled quality and reliability. Our products find versatile applications across the petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive sectors. Nestled in Changsha, Hunan, our state-of-the-art facility spans 4,000 square meters and boasts ISO9001:2015 quality management and ISO14001:2015 environmental management certifications. Our cutting-edge technology and skilled workforce guarantee superior product quality, meticulously tested using carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, stiffness testers, and more. With exports reaching the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, our competitively priced, high-quality products, timely deliveries, and exceptional after-sales services have earned us widespread acclaim from our esteemed clientele.
Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
Certifications

Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
Factory and Equippments

Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
Packaging & Shipping

Aluminum Oxide Ceramic Target 99.99% Round Disc Al2O3 Sputtering Target Customized Size
FAQ
 

1. Are you a trading company or a manufacturer?

Xinkang: We are proud to be a dedicated manufacturer, boasting over a decade of unparalleled expertise and innovation in the field.

2. How long is your delivery time?

Xinkang: For regular-sized items or samples, we ensure swift shipment within 3-5 days. For bulk quantities, expect delivery within approximately 15 days.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: We are pleased to offer sample orders with no MOQ requirements, ensuring flexibility for our customers.

4. What are your payment methods?

Xinkang: We accept a variety of payment methods, including T/T in advance, PayPal, Western Union, and more, for your convenience.

Feel free to contact us anytime! Our team is always ready to assist you with any inquiries or needs.

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