Type: | Metal Target |
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Shape: | Round |
Certification: | TUV, ISO, CE |
Material: | Cerium |
Purity: | 99.999% |
Size: | Customized |
Customization: |
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Product: | germanium sputtering target |
Purity: | 99.999% |
Size: | customized |
Shape: | Planar |
Packing: | Vacumm sealed, wooden case |
Germanium sputtering targets are made of 5N germanium crystals, due to its wide transmission range in the infrared and opaqueness in the visible light regions, germanium sputtering targets are used for depositing germanium thin film on the optic of thermal imaging camera. Such optics are usually working in the 8 to 14 micron range for passive thermal imaging and for hot-spot detection in military, mobile night vision, and fire fighting applications. It's also used in infrared spectroscopes and other optical equipment that require extremely sensitive infrared detectors.
But as germanium thin film has a very high refractive index (4.0), so it must be coated with a anti-reflection film.
Features
Chemical Composition: pure Ge
Available Purity: 5N, 6N
Crystal structure: Mono-crystalline, poly-crystalline
Conduction Type: N type
Resistivity: 0.03-50Ω.cm
Refractive index (10um): 4.0026
Absorption coefficient (/cm): ≤ 0.03
Optical transmittance: 46%
Surface finish: Ra 1.6um
Round target size: Diameter ≤ 450mm, thickness ≥ 0.5mm
Rectangle target size: 205 x 205mm max
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
Professional and efficient
We own a strong teamwork of professional R&D team,
manufacturing team, sales team and after-sales service team.
Provide you 12 hours fastest service.
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