• PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target

PVD Material Ceramic Al2O3 Sputtering Target

Type: Ceramic Target
Certification: TUV, ISO, CE
Purity: 99.99%
Size: Customized
MOQ: 1 PC
Free Sample: Accept
Customization:
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Manufacturer/Factory

Basic Info.

Model NO.
XK-Al2O3
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
Transport Package
Vacuum Sealed
Specification
customized
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

                            Thin film coating materials Al2O3 sputtering target 
  
Product:  Al2O3 sputtering target
Purity:   99.99%
Size:   customized
Shape:   Planar and rotary
Technology:   Hot press
Application:   infrared detectors and magnetic data storage field,etc
Packing:   Vacumm sealed, wooden case

PVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering Target
 

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Diamond Member Since 2018

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Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001