PVD Material Ceramic Al2O3 Sputtering Target

Product Details
Customization: Available
Type: Ceramic Target
Certification: TUV, ISO, CE

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  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
  • PVD Material Ceramic Al2O3 Sputtering Target
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Basic Info.

Model NO.
XK-Al2O3
Purity
99.99%
Size
Customized
MOQ
1 PC
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
Transport Package
Vacuum Sealed
Specification
customized
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

                            Thin film coating materials Al2O3 sputtering target 
  
Product:  Al2O3 sputtering target
Purity:   99.99%
Size:   customized
Shape:   Planar and rotary
Technology:   Hot press
Application:   infrared detectors and magnetic data storage field,etc
Packing:   Vacumm sealed, wooden case

PVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering TargetPVD Material Ceramic Al2O3 Sputtering Target
 

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