• High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
  • High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
  • High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
  • High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
  • High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
  • High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support

High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support

Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%
Type: Ceramic Plate
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Customization:
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Overview

Basic Info.

Model NO.
XK-LaB6
Materials
Lanthanum Hexaborid
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
2850000090
Production Capacity
10000PCS/Month

Product Description

High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
Product Description

XinKang Factory Supplies Premier Top-Ranking 99.9% Pure LaB6 Ceramic Target - Lanthanum Hexaborid Target for PVD Coating
Name Lanthanum Hexaborid Ceramic Sputtering Target / LaB6 ceramic targets
Material Lanthanum Hexaborid LaB6 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color Purple Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 4.7g/cm3
Melting Point 2715°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:Lanthanum Hexaboride (LaB6) exhibits metallic conductivity due to its B6 octahedral network, which stabilizes with La's valence electrons. LaB6's surface plasmon resonance absorption (~1000nm) surpasses infrared blocking materials like ITO in the near-infrared region. Its strong covalent B bonds provide a tight spatial network, endowing LaB6 with low volatility, minimal work function, high melting point, strength, and stability. These traits make LaB6 an essential material for field emission applications, particularly in electron microscope filaments. It boasts a density of 4.7g/cm^3. Various B-La compounds exist, with LaB6 being the most stable, making it indispensable in advanced material applications.
Lanthanum Hexaborid
Sputtering Target;
Purity: 99.9%;
Production Method: Cold Press Sintering;
Available Dimensions:
Circular Target: Diameter = 3 mm;
Rectangular Target: Length = 3 mm;
Rotary Target: L 4000 x Wall Thickness 15mm;
Minimum Order Quantity: 1 piece;
Type of Bonding: Indium, Elastomer;
Application Fields: Thin-film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
Premium NiO Sputtering Target - Designed for Superior Performance
High-Quality MoO3 Sputtering Target - Engineered for Precision
Exceptional WO3 Sputtering Target - Unmatched Consistency
Top-Tier LiFePO4 Sputtering Target - Reliable and Efficient
Advanced ZnS Sputtering Target - Optimal for High-Performance Applications
Superior Bi2Te3 Sputtering Target - Ideal for Cutting-Edge Technologies
Premium Ga2O3 Sputtering Target - Engineered for Excellence
High-Grade In2O3 Sputtering Target - Consistent and Reliable
Top-Quality Ta2O5 Sputtering Target - Perfect for Precision Applications
Exceptional Nb2O5 Sputtering Target - Designed for Durability and Performance
Product Parameters

Lanthanum Hexaborid Sputtering Target
/ LaB6 Ceramic Targets Certificate of Analysis (COA)
High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
Application:
1. Enhance and preserve the surface attributes of materials, elevating hardness, wear resistance, corrosion resistance, and more.
2. Crucial for the creation of cutting-edge materials and the enhancement of existing ones, applicable in solar cells, LEDs, flat panel displays, and beyond.
3. Essential in the fabrication of electronic components, including transistors and integrated circuits.
4. Vital for the development of superconductors, optical films, sensors, and a variety of advanced materials.

Related Products:
High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM SupportHigh Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier factory specializing in the research, development, production, processing, sales, and service of high-quality metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and other customized metal items. We adhere to the stringent standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and custom requirements from our clients, ensuring top-notch quality across all our offerings. These products find wide applications in industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our state-of-the-art factory, spanning 4000 square meters, is situated in Changsha, Hunan, and is certified with ISO9001:2015 and ISO14001:2015 management systems. Equipped with cutting-edge technology and a highly skilled team of technicians, we employ advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure superior product quality. Our commitment to excellence, competitive pricing, timely delivery, and unparalleled after-sales service have earned us a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Join us in experiencing the finest in metal materials and services.
High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
Certifications

High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
Factory and Equippments

High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
Packaging & Shipping

High Purity Lanthanum Hexaborid Ceramic Target for Magnetron Sputtering, OEM Support
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Diamond Member Since 2018

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Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001