High Purity Aluminum Titanium Sputtering Material for PVD Coating

• Customization: Available
• Type: Alloy Target
• Shape: Round,Square
• Certification: ISO
• Usage: PVD Coating Industry
• Size: Customers′ Requirements
• Purity: 99.9%
• MOQ: 1PCS
• Surface: Polished or Grinding
• Advantage: Uniform Inner Structure
• Product Name: Altisi Magnetron Target
• Package: Vacuum Package
• Certificate: ISO9001, COA, MSDS,ISO14001
• Packing: vacuum Sealed
• Transport Package: Vacuum Sealed Package Inside
• Trademark: Xinkang
• Origin: Hunan, China
• Production Capacity: 1000000 Piece/Pieces Per Month

Product Description

Product Name: High-Purity Aluminum Titanium Sputtering Target for Metal Processing Machinery

Category: Target Material

Keywords: High-purity aluminum titanium target, Metal processing machinery parts, Aluminum titanium sputtering material, Aluminum titanium alloy target, High-purity metal sputtering target, Aluminum titanium deposition material, Metal processing equipment parts, Aluminum titanium coating target, High-purity aluminum titanium alloy, Metal processing machinery components, AlTi target, AlTi plate

Description: Our High-Purity Aluminum Titanium Sputtering Target is meticulously engineered for metal processing machinery, delivering unmatched performance and reliability. Crafted from premium-grade aluminum titanium alloy, this sputtering target guarantees precise and uniform coating deposition, resulting in superior product quality. Perfect for a vast array of metal processing applications, it offers exceptional corrosion resistance and remarkable durability. Rely on our Aluminum Titanium Sputtering Target to significantly enhance the efficiency and effectiveness of your metal processing equipment, ensuring consistent, high-quality results every time.