| Customization: | Available |
|---|---|
| Type: | Metal Target |
| Shape: | Round |
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Sputtering target and evaporation materials manufacturer
| Product Name | Germanium target/pellets |
| Available Purity | 99.999%min,as you request |
| Available shape | Rectangle, Round, Rotary, Pellets, Ingots,as per your request |
| Size | D50.8x3mm thick, D3x3mm,D6x6mm,As per your request |
| Technolgy | Melting |
| Theoretical Density (g/cc) | 5.323 |
| COA | Available for COA( Certificate of Analysis), please contact sales |
| Quotation | We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation) |
| Application | Evaporation coating,Process,Decoration,LED,Semi, |
| Related products | W, Mo, Ta, Nb, V, Zr, Hf, Ti, Ni, Fe, Cr, Co,etc,Metal Alloy sputtering targets, Ceramic targets |
Description:
Germanium, element symbol Ge, atomic number 32, atomic weight 72.64, elemental germanium is a gray-white metalloid, shiny and hard, belonging to the carbon family. Its chemical properties are similar to those of tin and silicon in the same family. It is insoluble in water and has a density of 5.35g. /cm3, melting point is 937°C. Germanium is an excellent semiconductor commonly used in the manufacture of transistors and integrated circuits.
Application:
Pure germanium is a semiconductor with an appearance similar to elemental Silicon. Germanium naturally reacts and forms complexes with oxygen in nature like Silicon. But unlike Silicon, it is too reactive to be found naturally on Earth in the free (elemental) state. The Germanium sputtering targets are widely used in semiconductor applications.
Ge-5N-COA
Our hafnium target up to 99.95%. Low gas content and uniform particle size distribution.
Hafnium targets are widely used in physical evaporation deposition, magnetron sputtering and other technologies to prepare various thin film materials, such as oxides, nitrides, silicides and metals. In semiconductor manufacturing, hafnium targets are often used to prepare thin film materials such as silicon, silicon nitride, aluminum oxide, and zirconium oxide. These thin film materials play an important role in semiconductor devices, such as improving device stability and performance. In display manufacturing, hafnium targets are often used to prepare transparent electrode materials, such as indium tin oxide (ITO) and zinc oxide (ZnO).
Our factory covers an area of 4000 square meters. It has been certificated with IS09001:2015 quality management system and IS014001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore,India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Regardless of the order volume and size, we will try our best to meet your requirements and we are doing this for years
1.Are you trading company or manufacturer?
Xinkang:We are a professional manufacturer specialized in this field for over 10 years.
2.How long is your delivery time?
XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity.
3.Do you have MOQ?
XinKang:No,We support samples.
4.What is your payment method?
XinKang:T/T in advance, Paypal, Western Union and etc.
Welcome to contact us at any time!
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