High Purity Metal Alloy Material CuNi Sputtering Target

• Customization: Available
• Type: Alloy Target
• Certification: TUV, ISO, CE
• Model NO.: XK-CuNi
• Purity: 99.9%-99.95%
• Size: Customized
• MOQ: 1 PC
• Free Sample: Accept
• Packing: Wooden Case
• Certificate: Provide for Each Target
• Transport: by Air
• Delivery: 5-10 Days
• HS Code: 8486909900
• Production Capacity: 1000 PCS/Year

Product Description

                            Thin film coating materials CuNi sputtering target 
  

Product:	CuNi sputtering target
Purity:	99.9%-99.95%
Size:	customized
Shape:	Planar and rotary
Technology:	Vacuum Melting
Application:	infrared detectors and magnetic data storage field,etc
Packing:	Vacumm sealed, wooden case

        Copper Nickel Sputtering Target is produced by melting technology, it's usually used for depositing electromagnetic interference (EMI) shielding layer, for the field of electronic products such as smartphone, PAD, and etc. With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. 
 



                                            
                                                          PRODUCTION PROCESS