High Purity Metal Alloy Material CuNi Sputtering Target

Type: Alloy Target
Certification: TUV, ISO, CE
Purity: 99.9%-99.95%
Size: Customized
MOQ: 1 PC
Free Sample: Accept
Customization:

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Basic Info.

Model NO.
XK-CuNi
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

                            Thin film coating materials CuNi sputtering target 
  
Product: CuNi sputtering target
Purity:  99.9%-99.95%
Size:  customized
Shape:  Planar and rotary
Technology:  Vacuum Melting
Application:  infrared detectors and magnetic data storage field,etc
Packing:  Vacumm sealed, wooden case

        Copper Nickel Sputtering Target is produced by melting technology, it's usually used for depositing electromagnetic interference (EMI) shielding layer, for the field of electronic products such as smartphone, PAD, and etc. With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. 
 



                                            
                                                          PRODUCTION PROCESS

 

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Management System Certification
ISO 9001, ISO 14001