| Customization: | Available |
|---|---|
| Application: | Glass/Metal/Plastic/Ceramic Coating |
| Purity: | >99.99% |
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
| Product: | NiV 60/40wt%, other composition can be customized |
| Purity: | 99.9%-99.95% |
| Size: | customized |
| Shape: | Planar and rotary |
| Technology: | Vacuum Melting |
| Application: | semiconductor field to deposit barrier or adhesion layers |
| Packing: | Vacumm sealed, wooden case |
Nickel Chromium Sputtering Targets are produced by melting technology, it's used for depositing NiCr thin film. As this material has relatively large resistivity, more resistant to oxidation and low temperature coefficient of resistance, so NiCr thin films are widely used for making resistors thin film for IC application. Nickel chromium sputtering targets can also applied for low-E glass coating. With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
Features
Chemical Composition: NiCr93/7wt%, NiCr90/10wt%, NiCr80/20wt%, NiCr70/30wt%, NiCr60/40wt%, NiCr40/60wt%,NiCr50/50wt%
Segregation of weight: +/-0.5wt%
Available Purity: 2N8, 3N, 3N5
Production Technology: melting
Shapes: planar targets
Related Products
Copper Nickel Titanium Sputtering Target
Nickel Vanadium Sputtering Target
Nickel Iron Sputtering Target
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
Chemical Composition: pure gold
Available Purity: 4N-5N
Production Technology: EB melting
Shapes: planar targets, rotary targets
Average Grain Size: < 100um
Silver is a kind of precious materials.
Gold sputtering targets is a very important materials of semiconductor, it's used for depositing gold thin film on the surface of semiconductor chips, to form ohmic contact film, electrode or other films, it can form various metallic films system. Most of gold oxide film system can be used for manufacturing LED, microwave communication device, widely applied in spaceflight, aviation, semiconductor chips and Solar Cells.
COMPANY PROFILE:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
| Packaging Detail: | Inside: drying agent and vacuum sealed to prevent oxidization Outside: wooden case to avoid damage during transportation |
| Delivery Detail: | Within 3-15 working days . DHL, FedEx, UPS door to door service, 5-7 days from China to your country. |
){kind=link}