• Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
  • Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
  • Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
  • Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
  • Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
  • Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target

Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target

Application: Medical, Industrial, Electronics, Aviation, PVD Film Coating
Purity: 99.9%-99.9995%
Size: 1-3inch or as Your Request
OEM: Support
MOQ: 1PC
Materials: Al2O3
Customization:
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
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  • FAQ
Overview

Basic Info.

Model NO.
XK-Al2O3
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Customize
Trademark
XinKang
Origin
China
HS Code
7606910000
Production Capacity
10000PCS/Month

Product Description

Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
Product Description
 
XinKang Factory Supply Top Ranking 99.99 %Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target for PVD COATING
Name Aluminium Oxide Ceramic Sputtering Target (Al2O3 Ceramic Targets)
Material Aluminium Oxide Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.7g/cm3
Melting Point 660°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)
 
Description:

Aluminum is a silvery white light metal, celebrated for its exceptional malleability. Commonly fashioned into rods, sheets, foil, powders, strips, and filaments, it develops a protective oxide film in moist air to combat corrosion. When heated, aluminum powder  producing a brilliant white flame. This versatile element is soluble in dilute acids and alkalis but remains insoluble in water, with a relative density of 2.70, a melting point of 660 °C, and a boiling point of 2327 °C. Its outstanding properties-including light weight, superb electrical and thermal conductivity, high reflectivity, and oxidation resistance-render it an essential material across a myriad of industries.

Aluminum Pellets exhibit the same advantageous properties as elemental aluminum. As a chemical element designated by the symbol Al and atomic number 13, aluminum is a silvery-white, soft, ductile metal within the boron group. It is distinguished by its low density and notable corrosion resistance via passivation, alongside being non-magnetic and highly adaptable.

Aluminum and its numerous alloys are crucial in the aerospace sector and foundational to the transportation and construction industries, including architectural facades and window frames. Pure aluminum grades such as 3N8-4N8 are indispensable for rolling electrolytic capacitor aluminum foil, lighting fixtures, and data storage solutions. Ultra-pure grades like 5N-6N are essential for creating semiconductor devices, optoelectronic storage media, superconducting cable materials, and conducting scientific research in space exploration.

Our high-purity sputtering targets provide unparalleled benefits, ensuring your films attain superior electrical conductivity and minimal particle formation during the PVD process. Below is a typical Certificate of Analysis for our 5N aluminum sputtering target, highlighting its top-tier purity standards and exceptional performance attributes.
Product Parameters

Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
Application:

Application: This multifaceted material is perfect for an extensive array of sputtering techniques such as DC two-pole, three-pole, four-stage, RF, target-oriented, ion beam, and magnetron sputtering. It excels in the application of reflective, conductive, semiconductor, capacitor, decorative, and protective films. Additionally, it is crucial for integrated circuits and display technologies. When functional film precision is paramount, aluminum target material stands unrivaled.

Aluminum undergoes extraction from Al2O3 in bauxite, followed by electrolysis in molten cryolite, reaching a purity level typically above 99%. However, this standard does not meet the stringent requirements for high-quality aluminum targets, where extraordinary purity is essential. The high-purity aluminum for these targets is produced via advanced methods such as segregation, three-layer electrolysis, or combined zone smelting, leading to a significantly higher cost compared to standard industrial pure aluminum (99.7%). In China, the purity can achieve up to 99.9999% (6N). These high-purity aluminum ingots undergo processes like forging, rolling, and heat treatment to refine grain structure and enhance density, meeting the rigorous standards of sputtering aluminum targets. Following deformation, the aluminum undergoes precise mechanical processing. The production demands precision and exceptional surface quality, allowing for customization to the sizes required by vacuum coating machines.

Other Alloy Forms of Aluminum Sputtering Target
Include: Aluminum-Silicon, Aluminum-Copper, Aluminum-Magnesium, Aluminum-Zinc, and Aluminum-Rare Earth alloys.


Related Products:
Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round TargetCustomized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc
 
Company Profile
 
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier factory specializing in the research, development, production, processing, sales, and service of top-tier metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and other customized metal items. Adhering to stringent standards such as GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and specific customer requirements, our products are prominently utilized across various industries including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive sectors. Strategically located in Changsha, Hunan, our state-of-the-art facility spans 4000 square meters and carries ISO9001:2015 quality management and ISO14001:2015 environmental management certifications. Our cutting-edge equipment and expert workforce ensure the highest quality through rigorous testing with instruments like carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our commitment to excellence has earned us a strong export presence in the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Our high-quality products, competitive pricing, timely delivery, and exceptional after-sales service are highly esteemed by our global clientele.
Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
Certifications

Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
Factory and Equippments

Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
Packaging & Shipping

Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target
FAQ
 

1. Are you a trading company or a manufacturer?

Xinkang: We are a dedicated manufacturer with over a decade of expertise in the field.

2. How long is your delivery time?

Xinkang: For regular-sized items or samples, we ensure shipment within 3-5 days. For bulk orders, our delivery timeline extends to approximately 15 days, guaranteeing punctuality without compromising quality.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: Absolutely not, we welcome sample orders with no MOQ requirement, offering flexibility to meet your unique needs.

4. What are your payment methods?

Xinkang: We offer multiple convenient payment options including T/T in advance, PayPal, Western Union, and more, ensuring secure and hassle-free transactions.

Feel free to contact us anytime! We're here to assist you with any queries or needs.

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Management System Certification
ISO 9001, ISO 14001