Silicon Dioxide Ceramic Target for High Precision Sputtering

Product Details
Customization: Available
Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%

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  • Silicon Dioxide Ceramic Target for High Precision Sputtering
  • Silicon Dioxide Ceramic Target for High Precision Sputtering
  • Silicon Dioxide Ceramic Target for High Precision Sputtering
  • Silicon Dioxide Ceramic Target for High Precision Sputtering
  • Silicon Dioxide Ceramic Target for High Precision Sputtering
  • Silicon Dioxide Ceramic Target for High Precision Sputtering
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-SiO2
Materials
Silicon Dioxide
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3824999999
Production Capacity
10000PCS/Month

Product Description

Silicon Dioxide Ceramic Target for High Precision Sputtering
Product Description

XinKang Factory – Premium 99.995% Purity SiO2 Planar Sputtering Target: Silicon Dioxide Ceramic Target for Superior Coating Applications
Name Silicon Dioxide Ceramic Sputtering Target / SiO2 Ceramic targets
Material Silicon Dioxide SiO2 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.2g/cm3
Melting Point 1723°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Silica, commonly referred to as silica, boasts the chemical formula SiO2. In nature, silica exists in two forms: crystalline silica and amorphous silica. SiO2 features an impressive melting point of 1723°C and a boiling point of 2230°C, making it ideal for high-temperature applications. With a refractive index of approximately 1.6, SiO2 is optimal for optical uses.

Application Fields:
Versatile Uses: Employed as analytical reagents, fluorophores, and photoconductor materials. Essential in the production of dyes, coatings, pigments, glass, cured oil, and various optical filters, including laser window coatings.
Industries Served: Thin-film Photovoltaic, LOW-E Glass, Decorative & Tools Coating sectors.
As an indispensable raw material, silica is used for manufacturing glass, quartz glass, water glass, and optical fiber.It is crucial in the electronics industry, optical instruments, crafts, and refractory materials. A cornerstone material for scientific research.
Silica Applications: Flat glass, glass products, foundry sand, glass fiber, ceramic glaze, anti-rust sand blasting, filter sand, flux, refractory materials, and lightweight bubble concrete (Autoclaved Lightweight Concrete). Used in the production of critical components for the electronics industry, optical instruments, and crafts. Silica is vital for optical fiber manufacturing, producing quartz glass for high-temperature chemical instruments.Quartz sand is a primary material for glass manufacturing and building materials.

Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
Premium NiO Sputtering Target - Designed for Superior Performance
High-Quality MoO3 Sputtering Target - Engineered for Precision
Exceptional WO3 Sputtering Target - Unmatched Consistency
Top-Tier LiFePO4 Sputtering Target - Reliable and Efficient
Advanced ZnS Sputtering Target - Optimal for High-Performance Applications
Superior Bi2Te3 Sputtering Target - Ideal for Cutting-Edge Technologies
Premium Ga2O3 Sputtering Target - Engineered for Excellence
High-Grade In2O3 Sputtering Target - Consistent and Reliable
Top-Quality Ta2O5 Sputtering Target - Perfect for Precision Applications
Exceptional Nb2O5 Sputtering Target - Designed for Durability and Performance
Product Parameters


/ SiO2 Ceramic Targets Certificate of Analysis (COA)
Silicon Dioxide Ceramic Target for High Precision Sputtering
Application:
1. Enhance and preserve the surface attributes of materials, elevating hardness, wear resistance, corrosion resistance, and more.
2. Crucial for the creation of cutting-edge materials and the enhancement of existing ones. Widely applicable in solar cells, LEDs, flat panel displays, and more fields that demand high precision and reliability.
3. Essential in the fabrication of electronic components, including transistors and integrated circuits. Ensures superior performance and longevity in critical electronic applications.
4. Vital for the development of superconductors, optical films, sensors, and a variety of advanced materials. Contributes significantly to futuristic innovations and technological advancements.

Related Products:
Silicon Dioxide Ceramic Target for High Precision SputteringSilicon Dioxide Ceramic Target for High Precision Sputtering
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier factory specializing in the research, development, production, processing, sales, and service of high-quality metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and other customized metal items. We adhere to the stringent standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and custom requirements from our clients, ensuring top-notch quality across all our offerings. These products find wide applications in industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our state-of-the-art factory, spanning 4000 square meters, is situated in Changsha, Hunan, and is certified with ISO9001:2015 and ISO14001:2015 management systems. Equipped with cutting-edge technology and a highly skilled team of technicians, we employ advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure superior product quality. Our commitment to excellence, competitive pricing, timely delivery, and unparalleled after-sales service have earned us a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Join us in experiencing the finest in metal materials and services.
Silicon Dioxide Ceramic Target for High Precision Sputtering
Certifications

Silicon Dioxide Ceramic Target for High Precision Sputtering
Factory and Equippments

Silicon Dioxide Ceramic Target for High Precision Sputtering
Packaging & Shipping

Silicon Dioxide Ceramic Target for High Precision Sputtering
FAQ

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