• Aluminum Plate Sputtering Target for Magnetron Coating
  • Aluminum Plate Sputtering Target for Magnetron Coating
  • Aluminum Plate Sputtering Target for Magnetron Coating
  • Aluminum Plate Sputtering Target for Magnetron Coating
  • Aluminum Plate Sputtering Target for Magnetron Coating
  • Aluminum Plate Sputtering Target for Magnetron Coating

Aluminum Plate Sputtering Target for Magnetron Coating

Type: Metal Target
Certification: TUV, ISO, CE
Purity: 99.9%-99.9999%
Material: Aluminum
Size: Customized
Application: Glass/Metal/Plastic/Ceramic Coating
Customization:
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Manufacturer/Factory

Basic Info.

Model NO.
XK-Al
MOQ
1 PC
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Express
Delivery
5-10 Days
Transport Package
Wooden Case
Specification
any size
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

Aluminum/Al sputtering target features:

Chemical Composition: pure Aluminum

Available Purity: 3N-6N

Production Technology: EB melting

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  

Aluminum Sputtering Targets are produced by melting technology, usually applled for optical coating and semiconductor field. With up to 6N purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Aluminum Plate Sputtering Target for Magnetron CoatingAluminum Plate Sputtering Target for Magnetron Coating

COMPANY PROFILE:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

Aluminum Plate Sputtering Target for Magnetron CoatingAluminum Plate Sputtering Target for Magnetron Coating

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer       
 Aluminum Plate Sputtering Target for Magnetron Coating                                     
 OUR ADVANTAGE


1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm                                                   
Aluminum Plate Sputtering Target for Magnetron Coating
 
PACKING & DELIVERY
 
Packaging Detail:
Inside: drying agent and vacuum sealed to prevent oxidization
Outside: wooden case to avoid damage during transportation

 
Delivery Detail: Within 3-15 working days .
DHL, FedEx, UPS door to door service, 5-7 days from China to your country.
 
Aluminum Plate Sputtering Target for Magnetron Coating
OUR CERTIFICATE
Aluminum Plate Sputtering Target for Magnetron Coating
Aluminum Plate Sputtering Target for Magnetron Coating
 

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Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001