| Customization: | Available |
|---|---|
| Type: | Metal Target |
| Certification: | TUV, ISO, CE |
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Chemical Composition: pure Aluminum
Available Purity: 3N-6N
Production Technology: EB melting
Shapes: planar targets, rotary targets
Average Grain Size: < 100um
Aluminum Sputtering Targets are produced by melting technology, usually applled for optical coating and semiconductor field. With up to 6N purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
COMPANY PROFILE:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
| Packaging Detail: | Inside: drying agent and vacuum sealed to prevent oxidization Outside: wooden case to avoid damage during transportation |
| Delivery Detail: | Within 3-15 working days . DHL, FedEx, UPS door to door service, 5-7 days from China to your country. |
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