• Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
  • Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
  • Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
  • Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
  • Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
  • Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000

Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000

Type: Metal Target
Shape: Plate
Certification: TUV, ISO, CE
Purity: 99.9%-99.9999%
Size: D50.8X3mm or as Your Request
OEM: Support
Customization:
Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-Cu
MOQ
1PCS
Materials
Pure Metal Copper
Application
PVD Film Coating
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Copper Target
Trademark
XinKang
Origin
China
HS Code
7402000090
Production Capacity
10000PCS/Month

Product Description

Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
Product Description

XinKang Factory Supplied: Top Ranking 4N 99.99% High Purity Cuprum/Cu/Copper Planar Target for PVD Coating, Ideal for Evaporation Materials Copper Target
Name Metal Copper Sputtering Target (Cu Target)
Material Copper Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,
Size D50.8x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 8.954g/cm3
Melting Point 1083°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

The copper sputtering target from Changsha Xinkang Advanced Materials Co., Ltd. exhibits the same exceptional properties as pure metal copper (Cu). An element symbolized by Cu (from Latin: cuprum) and atomic number 29, copper is renowned for its softness, malleability, and extreme ductility, paired with outstanding thermal and electrical conductivity. When freshly exposed, pure copper reveals a striking pinkish-orange hue. Copper finds extensive usage as a conductor of heat and electricity, in construction materials, and as a vital component in numerous metal alloys. Produced using advanced melting technology, our Copper Sputtering Target is particularly suited for applications in the semiconductor sector, decorative coatings, and advanced packaging fields.

Our expertise enables us to manufacture copper sputtering targets with an impressive purity range of 99.9% to 99.9999%, featuring oxygen content as low as <1ppm. These targets are predominantly used in display and touch screen wiring and protective films, solar light-absorbing layers, semiconductor wiring, and more. We specialize in producing both planar copper sputtering targets (up to maximum G8.5 generation) and copper rotary targets, particularly for the touch screen industry. By employing significant deformation processes and controlling twin growth, we achieve a fine and uniform microstructure that ensures reduced erosion rates and minimizes particle formation sensitivity during sputtering.
Product Parameters

Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
Application:
Preparation process of copper sputtering target
Material preparation includes electrolytic purification, electron beam melting, chemical analysis, forging, rolling, annealing, metallographic inspection, machining, dimensional inspection, cleaning, final inspection, and packaging.

Copper sputtering target and preparation method
The copper undergoes an extraordinary purification process, elevating its purity from 99.95% to exceptional levels of 99.99%, 99.999%, and an extraordinary 99.9999% through sequential electrolysis and regional smelting. This level of purity, peaking at 99.9999% (6N), is among the highest in China. Starting with high-purity copper ingots, a series of forging, rolling, and heat treatment procedures are employed to refine the crystalline structure and enhance the density, perfectly aligning with the stringent requirements for sputtering copper targets. Post deformation treatment, the high-purity copper material is meticulously machined. The processing of copper targets demands impeccable precision and superior surface quality, ensuring they meet the exact specifications needed for vacuum coating machines.

Other alloy forms of copper sputtering targets
Our product range includes tin-copper, ***-copper, tungsten-copper, silver-copper, copper-phosphorus, nickel-copper alloy targets, and more.

Related Products:
Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
Company Profile

Factory:
Founded in 2014, Changsha Xinkang Advanced Materials Co., Ltd. stands as a beacon of expertise in the realm of metal materials. Specializing in the comprehensive spectrum of research, development, production, processing, sales, and service, our factory is synonymous with innovation and quality. Our diverse product range includes Metal Elements, Alloys, Metal Sputtering Targets, Alloy Targets, Ceramic Targets, Evaporation Materials, Metal Powder, Alloy Powder, and bespoke metal items. Adhering to the rigorous standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS, and specific customer requirements, our offerings are indispensable across industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, metallurgy, and automotive sectors. Nestled in Changsha, Hunan, our state-of-the-art facility spans an impressive 4,000 square meters, proudly holding ISO9001:2015 and ISO14001:2015 certifications. Equipped with cutting-edge technology and backed by a team of skilled technicians, we guarantee unparalleled product quality. Each item undergoes stringent testing using advanced instruments like carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our commitment to excellence has cemented our reputation globally, with exports reaching the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Customers highly value our superior quality, competitive pricing, prompt delivery, and exceptional after-sales service. Experience the pinnacle of metal material innovation with Changsha Xinkang Advanced Materials Co., Ltd.
Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
Certifications

Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
Factory and Equippments

Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
Packaging & Shipping

Magnetron Sputtering Target 99.95% Pure T2 Tu2 Copper Plate C10100 C11000
FAQ

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now

You Might Also Like

Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001