Customized Tantalum Nitride Target for PVD Coating

• Type: Ceramic Target
• Shape: Round
• Certification: TUV, ISO, CE
• Dimension: Customized
• Purity: 99.5%
• Application: PVD Coating
• Chemical Composition: 99.5% Tan
• MOQ: 1 PC
• Packing: Vacuum Sealed
• Certificated: ISO 9001, 14001
• Delivery: 7-15 Days
• Surface: Smooth
• Material: Tantalum Nitride
• Transport Package: Vacuum Sealed Package
• Specification: customized
• Trademark: XINKANG
• Origin: Changsha, China
• HS Code: 8486909900
• Production Capacity: 5000pieces/Year

Product Description

Product Name: High Purity Tantalum Nitride Sputtering Target (TaN)

Category: Target Material

Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor deposition

Description: Elevate your thin film technology to new heights with our High Purity Tantalum Nitride Sputtering Target. Meticulously engineered for the semiconductor industry, this premier ceramic target material is perfect for PVD coating applications. Boasting a high purity composition, our tantalum nitride target guarantees outstanding performance in vacuum deposition processes. Achieve precise, uniform thin film deposition effortlessly, thanks to the superior quality of this sputtering target. Transform the efficiency and effectiveness of your PVD coating operations with our tantalum nitride sputtering target. Invest in excellence for all your thin film technology requirements.