• 99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
  • 99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
  • 99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
  • 99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
  • 99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
  • 99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target

99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target

Application: Medical, Industrial, Electronics, Aviation, PVD Film Coating
Purity: 99.9%-99.9995%
Size: D3X3mm or as Your Request
OEM: Support
MOQ: 1kgs
Materials: Pure Metal Aluminum
Customization:
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  • FAQ
Overview

Basic Info.

Model NO.
XK-Al2O3
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Aluminum Pellets
Trademark
XinKang
Origin
China
HS Code
7606910000
Production Capacity
10000PCS/Month

Product Description

99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
Product Description
 
XinKang Factory Supply Top Ranking 99.9%-99.9995% Aluminum Pellets Al Vacuum Magnetron Aluminum Granules / Particles
Name Metal Alumina Pellets (Al2O3 Pellets)
Material Aluminum Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.7g/cm3
Melting Point 660°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)
 
Description:

Aluminum is a silvery white light metal, renowned for its malleability. Often crafted into rods, sheets, foil, powders, strips, and filaments, it forms a protective oxide film in moist air to prevent corrosion. When heated in the air, aluminum powder and foil burn intensely, emitting a brilliant white flame. Soluble in dilute acids and alkalis but insoluble in water, aluminum boasts a relative density of 2.70, a melting point of 660 ° C, and a boiling point of 2327 ° C. Its remarkable properties, including light weight, excellent electrical and thermal conductivity, high reflectivity, and oxidation resistance, make it an indispensable material across various industries.

Aluminum Pellets possess the same beneficial properties as metal aluminum. As a chemical element with the symbol Al and atomic number 13, aluminum is a silvery-white, soft, ductile metal in the boron group. Noteworthy for its low density and corrosion resistance via passivation, aluminum is non-magnetic and highly versatile.

Aluminum and its numerous alloys are of paramount importance in the aerospace sector and critical in transportation and construction industries, including building facades and window frames. Pure aluminum grades such as 3N8-4N8 are essential for rolling electrolytic capacitor aluminum foil, lighting fixtures, and data storage solutions. Ultra-pure grades like 5N-6N are vital for creating semiconductor devices, optoelectronic storage media fabrication, superconducting cable materials, and scientific research in space exploration.

Our high-purity sputtering targets offer unmatched benefits, ensuring your films achieve exceptional electrical conductivity and minimal particle formation during the PVD process. Below is a typical Certificate of Analysis for our 5N aluminum sputtering target, underscoring its high-purity standard and superior performance characteristics.
Product Parameters

99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
Application:

Application: This versatile material is ideal for a broad range of sputtering techniques including DC two-pole, three-pole, four-stage, RF, target-oriented, ion beam, and magnetron sputtering. It is perfect for applying reflective, conductive, semiconductor, capacitor, decorative, and protective films. Furthermore, it is indispensable for integrated circuits and display technologies, making aluminum target material the premier choice when functional film requirements are a priority.

Aluminum is derived by extracting Al2O3 from bauxite and electrolyzing it in molten cryolite, achieving a purity level generally above 99%. However, this purity is insufficient for producing high-quality aluminum targets. The most critical requirement is exceptional purity. The high-purity aluminum used in these targets is manufactured through advanced techniques like segregation, three-layer electrolysis, or combined zone smelting, resulting in a significantly higher price compared to the industrial pure aluminum (99.7%). In China, the highest obtainable purity reaches up to 99.9999% (6N). Utilizing these high-purity aluminum ingots as raw materials, processes like forging, rolling, and heat treatment refine the grain structure and enhance density to meet the exacting standards of sputtering aluminum targets. Post-deformation, the aluminum undergoes precise mechanical processing. The production of aluminum targets demands high precision and superior surface quality, enabling customization to the target sizes required by vacuum coating machines.

Other alloy forms of aluminum sputtering target
Include: Aluminum-Silicon, Aluminum-Copper, Aluminum-Magnesium, Aluminum-Zinc, and Aluminum-Rare Earth alloys.


Related Products:
99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc
Company Profile
 
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a professional factory specialized in the research, development, production, processing, sales and service of metal materials.Including: Metal elements, Alloy,metal sputtering targets, alloy targets,ceramic targets,evaporation materials, Metal powder,alloy powder,and other customized metal items. We process our products according to the standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS and other requirements from customers. And these products have been widely used in the petrochemical industry, aerospace and aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive and other fields. Our factory is located in Changsha, Hunan, which covers an area of 4000 square meters. It has been certificated with ISO9001:2015 quality management system and ISO14001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore, India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
Certifications

99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
Factory and Equippments

99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
Packaging & Shipping

99.99% Al2O3 Ceramic Target Alumina Aluminum Oxide Sputtering Target
FAQ
 

1. Are you a trading company or a manufacturer?

Xinkang: We are a dedicated manufacturer with over a decade of expertise in the field.


2. How long is your delivery time?

Xinkang: For regular-sized items or samples, shipment is within 3-5 days. For batch quantities, delivery takes approximately 15 days.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: No, we support sample orders without any MOQ.

4. What are your payment methods?

Xinkang: Payments can be made via T/T in advance, PayPal, Western Union, and more.

Feel free to contact us anytime!

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