Thin film coating materials Ga2O3 sputtering target
Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium or elastomer, to prolong service time.
Sintering technology are used to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.
| Product: |
Ga2O3 sputtering target |
| Purity: |
99.99% |
| Size: |
customized |
| Shape: |
Planar |
| Technology: |
Powder Metallurgy |
| Packing: |
Vacumm sealed, wooden case |
Our Advantage
Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target.
Our Quality Control System
Our Main Equipment
Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,
vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center,
grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc
PRODUCTION PROCESS
Our Certificates
1. We are an ISO9001 certified company.
2. We've been issued SGS Report.
3. We've been awarded as a High-Tech Enterprise.
4. We've been invested by the National Fund for High-end Equipment.
Our Exhibition
We have been attended exhibitions in Korea, Japan, USA, German, etc.
Application
Magnetic data storage/ Solar photovoltaic/ Glass coating
Semi-conductor/ Flat panel display/ Decoration coating
Our Products
We can also produce other metal sputtering targets, evaporation materials, crucibles, compound sputtering targets, etc.
We warmly welcome our dear customers from all around the world with OEM&ODM service.
Our Team
1. We've been providing high-quality products & service for many years.
2. The factory covers an area of 2,000 square meter.
3. We have over 30 employees, including a group of experts in non-ferrous industry.
4. We have a professional team foreign trade.
Audited Supplier 
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