| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Shape: | Square |
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Cobalt Tantalum Zirconium Sputtering Target is produced by melting technology, it's usually applied for magnetic data storage field. With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
Features
Chemical Composition: CoTaZr 90/5/5at%, CoTaZr91.5/4.5/4at%
Segregation of weight: +/-0.5wt%
Available Purity: 3N5
Production Technology: melting
Shapes: planar targets
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