Product Description
Thin film coating materials CoFe sputtering target
Cobalt Iron Sputtering Target are produced by melting technology, it can be used for depositing Cobalt Iron oxide thin films, which are the first choice for perpendicular magnetic recording thin film materials.
We can customize CoFe alloy according to customer's requirement, no matter for the composition, size or grain size.
Cobalt Iron Sputtering Target Features
Chemical Composition: CoFe90/10, CoFe50/50, CoFe 25/75, CoFeB 40/20/20, other compositions can be customized
Segregation of weight: +/-0.5wt%
Available Purity: 3N5
Production Technology: melting
Shapes: planar targets
PRODUCTION PROCESS
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