99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm

Product Details
Customization: Available
Type: Metal Target
Shape: Round

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  • 99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
  • 99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
  • 99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
  • 99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
  • 99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
  • 99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-MoRe
MOQ
1PCS
Materials
Pure Metal Molybdenum
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Molybdenum Rhenium Targets
Trademark
XinKang
Origin
China
HS Code
8102990000
Production Capacity
10000PCS/Month

Product Description

99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
Product Description

XinKang Factory Supply Top-Ranking 3N-3N5 99.9%-99.95% Purity Magnetron Mo Molybdenum Rhenium Alloy Planar Rotary Sputtering Targets for Optical Thin Film Coating
Name Metal Molybdenum Rhenium Planar Sputtering Targets (MoRe Target)
Material Molybdenum Rhenium alloy Metal Materials
Purity 99.9%-99.95%, 3N,3N5
Size 10x10x10mm,1-10mm, D3x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 10.28g/cm3
Melting Point 2617°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Molybdenum is a remarkable metallic element, symbolized as Mo, with an atomic number of 42, belonging to the VIB group metals. With a robust density of 10.2 g/cm3, molybdenum exhibits a captivating silver-white hue, noted for its hardness and toughness. It boasts a high melting point and excellent heat conductivity. Remarkably, it resists oxidation at room temperature when exposed to air. As a versatile transition element, molybdenum easily alters its oxidation state, leading to fascinating color variations in molybdenum ions.

The molybdenum (Mo) sputtering target mirrors the extraordinary properties of its raw material. In its purest form, molybdenum is a silvery-grey metal with a notable Mohs hardness of 5.5 and a standard atomic weight of 95.95 g/mol. Its impressive melting point of 2,623 °C (4,753 °F) is surpassed only by tantalum, osmium, rhenium, tungsten, and carbon among naturally occurring elements. Furthermore, it boasts one of the lowest coefficients of thermal expansion among commercially utilized metals.
Product Parameters

99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
Application:

Molybdenum boasts unparalleled properties like superior electrical and thermal conductivity, minimal thermal expansion, and exceptional corrosion resistance. This makes it indispensable in electric vacuum devices, high-temperature furnace components, insulation boards, and evaporation boats. Particularly for molybdenum sputtering targets, they find extensive applications in TFT-LCD manufacturing, thin-film solar cells, and semiconductor industries.

Welding method of molybdenum sputtering target
This welding technique involves providing molybdenum or molybdenum alloy target material, a back plate, and solder; nickel-plating the bonding surface of both the target and the back plate; preheating the materials to evenly distribute the solder. Once preheated, the bonding surfaces of the molybdenum target and the back plate are adhered and merged through welding to form a robust target component. The cooling process finalizes the component, ensuring a high-strength bond that meets the stringent demands of the sputtering process. Even for larger target areas, this method effectively prevents deformation and warping, especially for molybdenum or molybdenum alloy targets.

Other alloy forms of molybdenum sputtering target
Our diverse alloy options include molybdenum-titanium, molybdenum-sodium, molybdenum-niobium, and molybdenum-tantalum targets, among others.

Related Products:
99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
Metal elements Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Sb,Bi,Mn,Ga,Ge,In,W,Mo,Ta,Nb,V,Cr,Ti,Zr,Hf,etc
Rare earth materials Sc,Y,La,Ce,Pr,Nd,Sm,Eu,Gd,Tb,Dy,Ho,Er,Tm,Yb,Lu etc
Alloy Aluminum Master Alloy, Magnesium Master Alloy,Copper Alloy, Nickel alloy, Iron alloy, Cobalt alloy,etc
Ceramic materials Al2O3,TiO2,HfO2,Nb2O3,ZrO2,Ta2I5,MoO3,Sm2O3,wO3 NiO,Ga2O3,SiO,etc

Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd., stands as a premier factory specializing in the comprehensive spectrum of research, development, production, processing, sales, and service of high-quality metal materials. Our diverse product line includes: Metal elements, Alloys, Metal sputtering targets, Alloy targets, Ceramic targets, Evaporation materials, Metal powder, Alloy powder, and other bespoke metal items. Adhering strictly to standards such as GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and tailored customer requirements, our products have extensive applications across petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instruments, metallurgy, and automotive industries. Nestled in Changsha, Hunan, our state-of-the-art facility spans 4000 square meters and is certified with ISO9001:2015 (Quality Management) and ISO14001:2015 (Environmental Management) systems. Equipped with advanced technology and a robust team of technicians, we ensure superior quality through rigorous testing using instruments like carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our professional technicians, skilled workforce, and cutting-edge equipment allow us to deliver top-tier products and services. Our global outreach includes exports to the USA, Europe, Middle East, Japan, Korea, Singapore, India, and Kenya. We are highly valued by our clients for our quality, competitive pricing, timely delivery, and exceptional after-sales service.
99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
Certifications

99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
Factory and Equippments

99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
Packaging & Shipping

99.95% Purity More50wt% Molybdenum Rhenium Alloy Magnetron Sputtering Target D50.8X3mm
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