Manufacturer Sputtering Deposition Material Gold Sputter Target

• Type: Metal Target
• Certification: TUV, ISO, CE
• Material: Gold
• Purity: 99.99%-99.999%
• Size: Customized
• MOQ: 1 PC
• Model NO.: XK-Au
• Application: Glass/Metal/Plastic/Ceramic Coating
• Free Sample: Accept
• Packing: Wooden Case
• Certificate: Provide for Each Target
• Transport: by Express
• Delivery: 5-10 Days
• HS Code: 8486909900
• Production Capacity: 1000 PCS/Year

Product Description

 Thin film coating materials  Gold/Au  sputtering target
 

Product:	Gold/Au sputtering target
Purity:	99.99%-99.999%
Size:	customized
Shape:	Planar and rotary
Technology:	Vacuum Melting
Application:	infrared detectors and magnetic data storage field,etc
Packing:	Vacumm sealed, wooden case

Gold sputtering targets is a very important materials of semiconductor, it's used for depositing gold thin film on the surface of semiconductor chips, to form ohmic contact film, electrode or other films, it can form various metallic films system. Most of gold oxide film system can be used for manufacturing LED, microwave communication device, widely applied in spaceflight, aviation, semiconductor chips and Solar Cells.

 

Features

Target Materials: Gold Au

Purity: 4N, 4N5

Available Shape: Planar, foil

Actual Density: close to 100%

Size: ≥ 0.1mm thick, diameter 1" to 10"