| Customization: | Available |
|---|---|
| Type: | Metal Target |
| Certification: | TUV, ISO, CE |
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
| Product: | Gold/Au sputtering target |
| Purity: | 99.99%-99.999% |
| Size: | customized |
| Shape: | Planar and rotary |
| Technology: | Vacuum Melting |
| Application: | infrared detectors and magnetic data storage field,etc |
| Packing: | Vacumm sealed, wooden case |
Gold sputtering targets is a very important materials of semiconductor, it's used for depositing gold thin film on the surface of semiconductor chips, to form ohmic contact film, electrode or other films, it can form various metallic films system. Most of gold oxide film system can be used for manufacturing LED, microwave communication device, widely applied in spaceflight, aviation, semiconductor chips and Solar Cells.
Features
Target Materials: Gold Au
Purity: 4N, 4N5
Available Shape: Planar, foil
Actual Density: close to 100%
Size: ≥ 0.1mm thick, diameter 1" to 10"
){kind=link}