• 99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
  • 99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
  • 99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
  • 99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
  • 99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
  • 99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target

99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target

Application: Medical, Industrial, Electronics, Aviation, PVD Film Coating
Purity: 99.9%-99.9995%
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Materials: Al2O3
Customization:
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Overview

Basic Info.

Model NO.
XK-Al2O3
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Alumina Target D50.8mm
Trademark
XinKang
Origin
China
HS Code
7606910000
Production Capacity
10000PCS/Month

Product Description

99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
Product Description
 
XinKang Factory Supplies Premier Top-Ranking 99.99% Pure Aluminium Oxide Sputtering Target Alumina High Density Al2O3 Ceramic Target
Name Aluminium Oxide Ceramic Sputtering Target (Al2O3 Ceramic Targets)
Material Aluminium Oxide Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color white Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.7g/cm3
Melting Point 660°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)
 
Description:

Aluminum is a silvery white light metal, celebrated for its remarkable malleability. This versatile material is frequently fashioned into rods, sheets, foil, powders, strips, and filaments. In moist air, aluminum forms a protective oxide film that prevents corrosion. When heated, aluminum powder producing a dazzling white flame. While soluble in dilute acids and alkalis, aluminum remains insoluble in water. It boasts a relative density of 2.70, a melting point of 660 °C, and a boiling point of 2327 °C. Its unique attributes-light weight, superior electrical and thermal conductivity, high reflectivity, and exceptional oxidation resistance-render it indispensable across a myriad of industries.

Aluminum Pellets inherit the advantageous properties of metallic aluminum. As a chemical element with the symbol Al and atomic number 13, aluminum is a soft, ductile, silvery-white metal within the boron group. Distinguished by its low density and corrosion resistance through passivation, aluminum is non-magnetic and extremely adaptable for diverse applications.

Aluminum and its myriad alloys hold paramount significance in the aerospace sector and are critically important in transportation and construction industries, such as building facades and window frames. Pure aluminum grades, including 3N8-4N8, are crucial for rolling electrolytic capacitor aluminum foil, lighting fixtures, and data storage solutions. Ultra-pure grades such as 5N-6N are indispensable in manufacturing semiconductor devices, optoelectronic storage media, superconducting cable materials, and for facilitating advanced scientific research in space exploration.

Our high-purity sputtering targets offer unparalleled advantages, ensuring your films achieve exceptional electrical conductivity and minimal particle formation during the PVD process. Below is a typical Certificate of Analysis for our 5N aluminum sputtering target, highlighting its high-purity standard and outstanding performance characteristics.
Product Parameters

99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
Application:

Application: This versatile material is perfect for a broad spectrum of sputtering techniques including DC two-pole, three-pole, four-stage, RF, target-oriented, ion beam, and magnetron sputtering. It excels in applying reflective, conductive, semiconductor, capacitor, decorative, and protective films. Moreover, it is indispensable for integrated circuits and display technologies, making aluminum target material the premier choice when functional film requirements are paramount.

Aluminum is derived by extracting Al2O3 from bauxite and electrolyzing it in molten cryolite, achieving a purity level generally above 99%. However, this purity is insufficient for producing high-quality aluminum targets. The most critical requirement is exceptional purity. The high-purity aluminum used in these targets is manufactured through advanced techniques like segregation, three-layer electrolysis, or combined zone smelting, resulting in a significantly higher price compared to industrial pure aluminum (99.7%). In China, the highest obtainable purity reaches up to 99.9999% (6N). Utilizing these high-purity aluminum ingots as raw materials, processes like forging, rolling, and heat treatment refine the grain structure and enhance density to meet the exacting standards of sputtering aluminum targets. Post-deformation, the aluminum undergoes precise mechanical processing. The production of aluminum targets demands high precision and superior surface quality, enabling customization to the target sizes required by vacuum coating machines.


Other alloy forms of aluminum sputtering target
Include: Aluminum-Silicon, Aluminum-Copper, Aluminum-Magnesium, Aluminum-Zinc, and Aluminum-Rare Earth alloys.


Related Products:
99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc
 
Company Profile
 
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier factory specializing in the research, development, production, processing, sales, and service of high-quality metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and other customized metal items. We adhere to the stringent standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and custom requirements from our clients, ensuring top-notch quality across all our offerings. These products find wide applications in industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our state-of-the-art factory, spanning 4000 square meters, is situated in Changsha, Hunan, and is certified with ISO9001:2015 and ISO14001:2015 management systems. Equipped with cutting-edge technology and a highly skilled team of technicians, we employ advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure superior product quality. Our commitment to excellence, competitive pricing, timely delivery, and unparalleled after-sales service have earned us a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Join us in experiencing the finest in metal materials and services.
99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
Certifications

99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
Factory and Equippments

99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
Packaging & Shipping

99.99% Pure Aluminium Oxide Sputtering Target High Density Al2O3 Ceramic Target
FAQ
 

1. Are you a trading company or a manufacturer?

Xinkang: We proudly stand as a dedicated manufacturer with over a decade of unrivaled expertise in the advanced materials sector.

2. How long is your delivery time?

Xinkang: For regular-sized items or samples, shipment will be dispatched within 3-5 days. For batch quantities, expect a prompt delivery time of approximately 15 days.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: Absolutely not! We embrace flexibility with no MOQ, readily supporting sample orders to meet your needs.

4. What are your payment methods?

Xinkang: We offer a variety of payment methods for your convenience, including T/T in advance, PayPal, Western Union, and more.

Feel free to contact us anytime! Your inquiries are always welcome.

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Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001