• High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
  • High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
  • High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
  • High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
  • High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
  • High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials

High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials

Type: Metal Target
Shape: Plate
Certification: TUV, ISO, CE
Purity: 99.9%-99.9999%
Size: D50.8X3mm or as Your Request
OEM: Support
Customization:
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Overview

Basic Info.

Model NO.
XK-Cu
MOQ
1PCS
Materials
Pure Metal Copper
Application
PVD Film Coating
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Copper Target
Trademark
XinKang
Origin
China
HS Code
7402000090
Production Capacity
10000PCS/Month

Product Description

High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
Product Description

XinKang Factory Supply Top Ranking 4N 99.99% High Purity Cuprum/Cu/Copper Planar Target for PVD Coating for Evaporation Materials Copper Target
Name Metal Copper Sputtering Target (Cu Target)
Material Copper Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,
Size D50.8x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 8.954g/cm3
Melting Point 1083°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

The copper sputtering target from Changsha Xinkang Advanced Materials Co., Ltd. retains all the admired properties of high-quality copper (Cu). Copper, with its chemical symbol Cu (from Latin: cuprum) and atomic number 29, is renowned for its softness, malleability, and ductility, coupled with exceptional thermal and electrical conductivity. When freshly exposed, pure copper exhibits a distinctive pinkish-orange hue. This versatile metal is extensively utilized as a conductor of heat and electricity, in construction, and as a key component in various metal alloys. The Copper Sputtering Target, meticulously produced using state-of-the-art melting technology, finds widespread application in the semiconductor industry, decorative coatings, and advanced packaging fields.

Our copper sputtering targets boast an impressive purity range from 99.9% to a staggering 99.9999%, with oxygen content as low as <1ppm. These targets are primarily employed in display screens, touch screen wiring, protective films, solar light-absorbing layers, and semiconductor wiring. We specialize in manufacturing both planar copper sputtering targets (up to G8.5 generation) and copper rotary targets, essential for the touch screen industry. Given the challenges of grain fragmentation, we utilize large deformation processing and stringent twin growth control to achieve a refined, uniform microstructure. This meticulous process ensures a reduced erosion rate and minimizes particle formation sensitivity during sputtering, delivering superior performance.
Product Parameters

High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
Application:
Preparation Process of Copper Sputtering Target
Material Preparation: Through a meticulous process involving electrolytic purification and electron beam melting, followed by chemical analysis, forging, rolling, and annealing. This is succeeded by metallographic inspection, precision machining, dimensional inspection, thorough cleaning, final inspection, and careful packaging.

Copper Sputtering Target and Its Preparation Method
With an initial purity of 99.95%, the copper undergoes several electrolysis cycles and regional smelting to achieve purities of 99.99%, 99.999%, and an extraordinary 99.9999% (6N)—the highest in China. Utilizing high-purity copper ingots, the materials are forged, rolled, and heat-treated to refine the crystal grains, increasing density and ensuring they meet sputtering copper target standards. Post-deformation, the high-purity copper material is precisely machined to achieve the exact dimensions and superior surface quality required for the vacuum coating machine.

Other Alloy Forms of Copper Sputtering Targets
Explore a diverse range of alloy targets including Tin-Copper, ***-Copper, Tungsten-Copper, Silver-Copper, Copper-Phosphorus, and Nickel-Copper.

Related Products:
High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal MaterialsHigh Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal MaterialsHigh Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal MaterialsHigh Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a professional factory specialized in the research, development, production, processing, sales and service of metal materials.Including: Metal elements, Alloy,metal sputtering targets, alloy targets,ceramic targets,evaporation materials, Metal powder,alloy powder,and other customized metal items. We process our products according to the standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS and other requirements from customers. And these products have been widely used in the petrochemical industry, aerospace and aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive and other fields. Our factory is located in Changsha, Hunan, which covers an area of 4000 square meters. It has been certificated with ISO9001:2015 quality management system and ISO14001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore, India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
Certifications

High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
Factory and Equippments

High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
Packaging & Shipping

High Purity 99.95% Oxygen Free Copper Plate C10100 C11000 C12000 Metal Materials
FAQ

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