High Purity Zinc Oxide ZnO Sputtering Target for Magnetron Coating

Type: Ceramic Target
Certification: TUV, ISO, CE
Purity: 99.99%
Size: Customized
MOQ: 1 PC
Free Sample: Accept
Customization:

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Basic Info.

Model NO.
XK-ZnO
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

                            Thin film coating materials ZnO sputtering target 

Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium or elastomer, to prolong service time.

Sintering technology are used  to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.

  
Product: ZnO sputtering target
Purity:  99.99%
Size:  customized
Shape:  Planar 
Technology:  Powder Metallurgy
Packing:  Vacumm sealed, wooden case
     
                                
                                                         PRODUCTION PROCESS

 

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Diamond Member Since 2018

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Management System Certification
ISO 9001, ISO 14001