Aluminum Sputtering Target for PVD Coating

• Type: Metal Target
• Shape: Round
• Certification: TUV, ISO, CE
• Materials: Aluminum Al
• Purity: 99.5%, 99.8%, 99.9%, 99.95%
• MOQ: 1PC
• Model NO.: XK-Al
• Application: Semiconductor
• Free Sample: Available
• Packing: Vacuum Packed
• Certificate: Coa, Coc
• Delivery: 10-20 Days
• Transport: by Air, by Sea
• Certificate of Origin: Available
• Transport Package: Vacuum Sealed
• Specification: 100mm dia. x 45mm, 95mm dia. x 45mm, 63 x 32mm
• Trademark: no
• Origin: China
• HS Code: 848690
• Production Capacity: 2000PCS/Month

Product Description

Features of Aluminum Sputtering Targets

Chemical Composition: pure Al
Available Purity: 2N5, 3N, 4N, 5N, 5N5
Production Technology: melting
Shapes: planar targets, rotary targets
Average Grain Size: < 300um, structure of fine grains can be customized


Application of Aluminum Sputtering Targets

Aluminum Sputtering Targets are produced by melting technology, usually apply for optical coating and semiconductor field. With up to 5N purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.