• Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
  • Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
  • Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
  • Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
  • Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
  • Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering

Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering

Type: Metal Target
Shape: Round
Certification: TUV, ISO, CE
Purity: 99.9%-99.9999%
Size: D50.8X3mm or as Your Request
OEM: Support
Customization:
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Overview

Basic Info.

Model NO.
XK-Cu
MOQ
1PCS
Materials
Pure Metal Copper
Application
PVD Film Coating
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Copper Crucible
Trademark
XinKang
Origin
China
HS Code
7402000090
Production Capacity
10000PCS/Month

Product Description

Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
Product Description

XinKang Factory Supply Top Ranking Wholesales 99.95% Purity Cu Copper Crucible - Ideal for Induction Furnace Applications and Evaporation Materials. Our premium Copper Target ensures unmatched quality and performance.
Name Metal Copper Crucible (Cu Crucible)
Material Copper Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,
Size D50.8x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 8.954g/cm3
Melting Point 1083°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

The copper sputtering target offers identical properties to metal copper (Cu). Copper, denoted by the symbol Cu (from Latin: cuprum) and atomic number 29, is renowned for being soft, malleable, and ductile, with exceptional thermal and electrical conductivity. Pure copper features a pinkish-orange hue upon exposure. Its uses span from heat and electricity conduction to building construction and alloy formation. Manufactured through advanced melting technology, our Copper Sputtering Target is a cornerstone in the semiconductor, decorative coating, and advanced packaging sectors.

Our copper sputtering targets boast purities ranging from 99.9% to an exceptional 99.9999%, with oxygen content as low as <1ppm. These targets are pivotal in display screen and touch screen wiring, protective films, solar light absorption layers, semiconductor wiring, and more. We specialize in both planar copper sputtering targets (up to G8.5 generation) and copper rotary targets, primarily for the touch screen industry. Due to the challenge in grain breakage, we employ significant deformation processing and twin growth control to achieve a fine and uniform microstructure, thereby ensuring a reduced erosion rate and minimized particle formation during sputtering.
Product Parameters

Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
Application:
Preparation Process of Copper Sputtering Target
Material Preparation: An intricate journey involving electrolytic purification, electron beam melting, and meticulous chemical analysis. The material then undergoes forging, rolling, annealing, metallographic inspection, machining, dimensional inspection, thorough cleaning, final inspection, and precise packaging.

Copper Sputtering Target and Its Preparation Method
The copper undergoes a rigorous purification process, advancing from 99.95% to remarkable purities of 99.99%, 99.999%, and even 99.9999% through successive electrolysis and regional smelting steps. The highest purity achieved in China reaches an astonishing 99.9999% (6N). Starting with high-purity copper ingots, forging, rolling, and heat treatments refine the copper, reducing crystal grain size and increasing density to meet sputtering target specifications. Post-deformation, the high-purity copper is meticulously machined to meet the exact dimension and surface quality standards required by vacuum coating machinery.

Various Alloy Forms of Copper Sputtering Targets
Our diverse range includes tin-copper, ***-copper, tungsten-copper, silver-copper, copper-phosphorus, and nickel-copper alloy targets, among others.

Related Products:
Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron SputteringXinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron SputteringXinkang Copper Plate Planar Targets 99.999% Purity for Magnetron SputteringXinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a professional factory specialized in the research, development, production, processing, sales and service of metal materials.Including: Metal elements, Alloy,metal sputtering targets, alloy targets,ceramic targets,evaporation materials, Metal powder,alloy powder,and other customized metal items. We process our products according to the standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS and other requirements from customers. And these products have been widely used in the petrochemical industry, aerospace and aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive and other fields. Our factory is located in Changsha, Hunan, which covers an area of 4000 square meters. It has been certificated with ISO9001:2015 quality management system and ISO14001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore, India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
Certifications

Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
Factory and Equippments

Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
Packaging & Shipping

Xinkang Copper Plate Planar Targets 99.999% Purity for Magnetron Sputtering
FAQ

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