99.99% Pure Tin Target Sn Magnetron Sputtering Target for Thin Film Coating

• Customization: Available
• After-sales Service: Within 30 Days After Shipment
• Condition: New
• Model NO.: XK-Sn 01
• Certification: RoHS, ISO9001
• Material: Pure Tin
• Application: Metallurgy,Semiconductor,Evaporation
• CAS No: 7440-31-5
• Usage: PVD Film Coating
• Shape: Plate,Circle,Pellets
• Delivery Time: 7-21days
• Keywords: Metal Tin Metallurgy
• Size: D50.8X3mm or as Request
• Purity: 99.9-99.99%
• Chemical Composition: Sn
• Appearance: Polished Surface
• MOQ: 1PCS
• Product Name: Metal Tin Targets
• Package: Vacuum Blister
• Transport Package: Vacuum Sealed Package Inside
• Specification: customized
• Trademark: XinKang
• Origin: Hunan, China
• Production Capacity: 1000000 Piece/Pieces Per Month

Product Description

Product Description

 

XinKang Hot Sale Sn Tin Sputtering Target 99.99% Purity Metal Tin Magnetron Target for Optical Thin Film Coating Evaporation Experiments

Name	Metal Tin Sn Sputtering Targets
Purity	99.9%-99.99%
Size	1-10mm,10x10x10mm,D3x3mm, D6x6mm,2inch,3inch, As request
Symbol	Sn
Density	7.29g/cm³
Melting Point	232
Shape	Planar target, Rotary target.Pellets, Piece,
MOQ	1KGS
Application	Experiments materials,Evaporation materials, PVD Film Coating and etc

Application of tin sputtering target

The tin sputtering target from Changsha Xinkang Advanced Materials Co., Ltd. is ingeniously designed for high-precision thin film deposition. This versatile product is employed across a variety of industries including fuel cells, decorative coatings, semiconductors, displays, LEDs, photovoltaic devices, and glass coatings. Beyond thin films, tin's anti-corrosive properties make it invaluable in coating other metals. Moreover, tin alloys, such as those found in soft solder, bronze, and phosphor bronze, play a crucial role in modern technology. A notable example is the niobium-tin alloy, essential for manufacturing superconducting magnets.

Below is a typical Certificate of Analysis for our 4N Tin Sputtering Target.

Analytical Methods:
1. Metallic elements were precisely analyzed using ICP-OES;
2. Gas elements underwent thorough analysis with LECO.

Application: Tin Metal Materials:

Other Related Sputtering Targets

Metal Target	Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets
Alloy Target	Ni,Fe,Co,Cu,Al alloy. and special alloy
Evaporation Materials	Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc
Ceramic Targets	Oxide Ceramic, Compound ceramic targets.

 

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