| Shape: | Square |
|---|---|
| Grade: | Aluminium |
| Alloy: | Non-alloy |
| CAS No: | 7429-90-5 |
| Usage: | PVD Film Coating |
| Delivery Time: | 7-21days, 15-21 Days |
| Customization: |
|---|
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Hot Sale Customize Size 99.99% Aluminum Plate Metal Al Aluminium Sheets 6061 6063 7075 6082 Al Aluminum Plate checkered plate for cookwares and lights
| Name | Metal Aluminum Plate |
| Purity | 99.9%-99.995% |
| Size | 372x74x6mm, D3x3mm,D6x6mm,D50.8x3mm, 2inch,3inch, As request |
| Boiling Point | 2467 |
| Density | 2.7g/cm³ |
| Melting Point | 660.0 |
| Shape | Planar target, Rotary target,Arc Cathode. |
| MOQ | 1PCS |
| Application | Evaporation materials, PVD Film Coating and etc |
Aluminum sputtering target has the same function as metal aluminum.Aluminium is a chemical element with the symbol Al and atomic number 13. It is a silvery-white, soft, non-magnetic and ductile metal in the boron group. Aluminium is remarkable for its low density and its ability to resist corrosion through the phenomenon of passivation. Aluminium and its alloys are vital to the aerospace industry and important in transportation and building industries, such as building facades and window frames.3N8-4N8 pure aluminum is used for rolling electrolytic capacitor aluminum foil, lighting fixtures and data storage. 5N-6N ultra-pure aluminum is used in the manufacture of semiconductor devices, fabrication of optoelectronic storage media, superconducting cable stabilization materials, and space shuttle scientific research.
The sputtering targets we produced are high purity, it's most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for Our aluminum sputtering target is high purity, the most important benefit is that the films will possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Following is a typically Certificate of analysis for 5N aluminum sputtering target.
Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.
Application: Aluminum Sputtering Targets
Other Related Sputtering Targets
| Metal Target | Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets |
| Alloy Target | Ni,Fe,Co,Cu,Al alloy. and special alloy |
| Evaporation Materials | Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc |
| Ceramic Targets | Oxide Ceramic, Compound ceramic targets. |
1. Are you trading company or manufacturer ?
Xinkang: We are a professional manufacturer specialized in this field for over 10 years.
2: How long is your delivery time?
Xinkang: Shipment can be made in 5-7 days for those regular size, or samples , and 15-20 days for batch quantity.
3: Do you have MOQ ?
Xinkang: No, we support samples.
4: What is your payment method?
Xinkang: T/T in advance, Paypal , Western Union and etc.
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