| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Certification: | TUV, ISO, CE |
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| Product: | NiV 93/7wt%, other composition can be customized |
| Purity: | 99.9%-99.95% |
| Size: | customized |
| Shape: | Planar and rotary |
| Technology: | Vacuum Melting |
| Application: | semiconductor field to deposit barrier or adhesion layers |
| Packing: | Vacumm sealed, wooden case |
Nickel vanadium Sputtering Targets are produced by vacuum melting technology,
they are usually applied for semiconductor field to deposit barrier or adhesion layers,
and also applied for display and micro-electronic fields. Our factory have 10 years
more production experience of nickel vanadium targets, with up to 4N purity,
special annealing treatment, uniform and fine grain size, lower oxygen content,
our customers can obtain constant erosion rates as well as high purity and
homogeneous thin film coating during PVD process.
Features
Chemical Composition: NiV 93/7wt%, other composition can be customized
Segregation of weight: +/-0.5wt%
Production Technology: melting
Shapes: planar targets, rotary targets
Average Grain Size: < 100um
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
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