| Customization: | Available |
|---|---|
| Type: | Metal Target |
| Shape: | Round |
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Sputtering target and evaporation materials manufacturer
| Product Name | Hafnium target/pellets |
| Available Purity | 99.95%min,as you request |
| Available shape | Rectangle, Round, Rotary, Pellets, Ingots,as per your request |
| Size | D50.8x3mm thick, D3x3mm,D6x6mm,As per your request |
| Technolgy | Melting |
| Theoretical Density (g/cc) | 13.31 |
| COA | Available for COA( Certificate of Analysis), please contact sales |
| Quotation | We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation) |
| Application | Evaporation coating,Process,Decoration,LED,Semi, |
| Related products | W, Mo, Ta, Nb, V, Zr, Hf, Ti, Ni, Fe, Cr, Co,etc,Metal Alloy sputtering targets, Ceramic targets |
Description:
Hafnium Sputtering Targets are primarily used in the field of thin film deposition, a key process in semiconductor manufacturing, optics, and various coatings. The sputtering process involves bombarding a target material (such as hafnium) with ions, causing atoms of the material to be ejected and deposited onto a substrate to form thin films.
Semiconductor Manufacturing
Gate Dielectrics: Hafnium is increasingly used in semiconductor devices, especially in the production of high-k dielectrics for MOSFETs (metal-oxide-semiconductor field-effect transistors). Hafnium dioxide (HfO2) is used as a high-k dielectric material in modern integrated circuits, replacing silicon dioxide. The sputtering of hafnium targets allows for the deposition of high-quality HfO2 thin films with the desired electrical properties.
Insulating Layers: In advanced semiconductor devices, hafnium-based materials help to reduce leakage currents and improve the overall performance of transistors, particularly as devices scale down to smaller dimensions.
Optical Coatings
Anti-Reflective Coatings: Hafnium can be used in the deposition of thin films for optical coatings, such as anti-reflective or mirror coatings. Due to its excellent refractive index and stability, hafnium oxide films are often used for optical components like lenses, mirrors, and filters, especially in high-performance optical systems.
Hard Coatings: Hafnium-based coatings are also used for protective coatings on optical elements, where they provide durability and resistance to wear and environmental degradation.
Thin Film Deposition for Aerospace & Defense
Thermal Barrier Coatings: Hafnium, due to its high melting point and excellent heat resistance, is used in thin film applications for thermal barrier coatings in aerospace and defense industries. These coatings help protect components such as turbine blades and other high-temperature parts from extreme heat.
Radiation Shielding: Hafnium films can also be used for radiation shielding in aerospace applications, where its ability to absorb neutrons makes it useful for protecting sensitive equipment from radiation.
Hard Disk Drives (HDD)
Magnetic Layer Coatings: Hafnium-based materials are sometimes used in the deposition of thin magnetic layers in hard disk drives (HDDs). These coatings improve the performance and longevity of magnetic storage devices by enhancing their resistance to wear and reducing signal interference.
Microelectromechanical Systems (MEMS)
Structural Layers: Hafnium films are used in the manufacture of MEMS devices, where they serve as structural or insulating layers, especially in components that need to operate under high temperatures or in radiation-prone environments.
Hf-3N5-COA
Our hafnium target up to 99.95%. Low gas content and uniform particle size distribution.
Hafnium targets are widely used in physical evaporation deposition, magnetron sputtering and other technologies to prepare various thin film materials, such as oxides, nitrides, silicides and metals. In semiconductor manufacturing, hafnium targets are often used to prepare thin film materials such as silicon, silicon nitride, aluminum oxide, and zirconium oxide. These thin film materials play an important role in semiconductor devices, such as improving device stability and performance. In display manufacturing, hafnium targets are often used to prepare transparent electrode materials, such as indium tin oxide (ITO) and zinc oxide (ZnO).
Our factory covers an area of 4000 square meters. It has been certificated with IS09001:2015 quality management system and IS014001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore,India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Regardless of the order volume and size, we will try our best to meet your requirements and we are doing this for years
1.Are you trading company or manufacturer?
Xinkang:We are a professional manufacturer specialized in this field for over 10 years.
2.How long is your delivery time?
XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity.
3.Do you have MOQ?
XinKang:No,We support samples.
4.What is your payment method?
XinKang:T/T in advance, Paypal, Western Union and etc.
Welcome to contact us at any time!
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