Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance

Product Details
Customization: Available
Type: Ceramic Target
Shape: Round

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  • Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
  • Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
  • Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
  • Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
  • Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
  • Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Factory and Equippments
  • Certifications
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-Si3N4
Purity
99.9%
Size
D50.8X3mm,D3X3mm, D50.8X3mm, or as Your Request
OEM
Support
MOQ
1PCS
Materials
Silicon Nitride
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Si3N4 Ceramic Target
Trademark
XinKang
Origin
China
HS Code
6914100000
Production Capacity
10000PCS/Month

Product Description

Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Product Description
XinKang Factory presents our premier offering: the top-ranking Compound Si3N4 Target. This Silicon Nitride Sputtering Target is engineered for excellence in advanced optical coatings—a perfect synergy of innovation and precision.
Name Si3n4 Target Silicon Nitride Sputtering Target Ceramic Sputtering Target  (Si3N4 Targets)
Material Silicon Nitride Ceramic Materials
Purity 99.9%-99.99% 3N,3N5,4N etc
Size D50.8x3mm,1-10mm, D3x3mm, 2inch,3inch,Or As Request
Color Gray Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Technolgy Sintering
Type of Bonding  Indium, Elastomer
Density 2-3g/cm3
Melting Point 1800°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)
Description:
Experience the remarkable attributes of our Si3N4 Sputtering Target. With a molecular mass of 140.28, it boasts a versatile appearance in shades of gray, white, or off-white. This high-temperature compound defies melting, showcasing supreme resistance to high-temperature creep. The binder-free reactive sintered silicon nitride softens at a remarkable load temperature above 1800°C. Its hexagonal crystal structure presents a robust hexahedral form. Our reaction-sintered Si3N4 features a density range of 1.8~2.7g/cm3, while the hot-pressed variant offers a density of 3.12~3.22g/cm3, ensuring consistency and reliability in your applications.
Product Parameters

Experience the exceptional purity of our Si3N4, refined to an impressive 99.99% as certified in our COA.

Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Application:
Silicon nitride ceramic materials are at the forefront of innovation, offering versatile applications across industries. Ideal for high-temperature engineering components and advanced refractory materials in the metallurgical sector, they excel in creating corrosion-resistant components and sealing solutions in the chemical industry. In the machining industry, they are the material of choice for high-performance knives and cutting tools. These materials shine in ultra-high temperature environments, finding roles in gas turbines, aircraft engines, and electric furnaces, where durability is paramount.

1. This versatile material is a cornerstone in powder metallurgy, fine ceramic raw material production, and as a key component in conductive and decorative materials. Its prominence in high-temperature resistance and wear resistance makes it invaluable in aerospace and numerous other fields. With exceptional electrical conductivity, it is ideal for use in electrodes and electrical contacts for molten salt electrolysis, and serves as a crucial additive in hard tool manufacturing.
2. Widely employed in powder metallurgy, this material serves as a fine ceramic raw material powder, integral in conductive materials, and adds value as a decorative material.
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Related Products:
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Metal elements Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Sb,Bi,Mn,Ga,Ge,In,W,Mo,Ta,Nb,V,Cr,Ti,Zr,Hf,etc
Rare earth materials Sc,Y,La,Ce,Pr,Nd,Sm,Eu,Gd,Tb,Dy,Ho,Er,Tm,Yb,Lu etc
Alloy Aluminum Master Alloy, Magnesium Master Alloy,Copper Alloy, Nickel alloy, Iron alloy, Cobalt alloy,etc
Ceramic materials Al2O3,TiO2,HfO2,Nb2O3,ZrO2,Ta2I5,MoO3,Sm2O3,wO3 NiO,Ga2O3,SiO,etc
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
Company Profile
Factory:
Established in 2014, Changsha XinKang Advanced Materials Co., Ltd stands as a beacon of expertise in metal materials research, development, production, processing, sales, and service. We offer an impressive array of products, including metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, and evaporation materials, alongside metal and alloy powders. Customization is our forte, crafted to meet standards such as GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and specific customer requirements. Our offerings are pivotal in sectors like petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, metallurgy, and automotive. Our cutting-edge Changsha facility spans 4000 square meters and is distinguished by its ISO9001:2015 and ISO14001:2015 certifications. Here, advanced technology and a skilled workforce ensure quality through rigorous testing with state-of-the-art instruments like carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our global footprint includes exports to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, where our products are lauded for their unparalleled quality, competitive pricing, prompt delivery, and exceptional after-sales support.
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Factory and Equippments
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Certifications
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
Packaging & Shipping
Si3n4 Sputtering Target with 99.9% Purity for Superior Coating Performance
FAQ

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