| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Certification: | TUV, ISO, CE |
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Zinc Tin Sputtering Targets are produced by melting technology, it's usually applied for glass coating. With up to 4N purity, special annealing treatment, uniform and fine grain size, low oxygen content, our customers can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
Features
Chemical Composition: ZnSn 50/50wt%, ZnSn 52:48wt%, special composition can be customized
Segregation of weight: +/-0.5wt%
Available Purity: 3N5, 4N
Production Technology: Melting
Shapes: planar targets, rotary target
Average Grain Size: < 100um
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