High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material

Product Details
Customization: Available
Type: Ceramic Target
Shape: Round

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  • High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
  • High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
  • High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
  • High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
  • High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
  • High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
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Basic Info.

Model NO.
XK-Al2O3 03
Purity
99.5%-99.95%
Size
Customized
Delivery
15-18days
Certificate
ISO9001:2015
MOQ
1PC
Availability
Target, Wire, Segment, Granule, Ingot, Sheet
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
1′′-8′′, or as per your request
Trademark
No
Origin
China
HS Code
8007009000
Production Capacity
10000PCS/Month

Product Description

High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition MaterialHigh Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
Product Name Aluminum Oxide ceramic target
Available Purity 99.99%min,as you request
Available shape round, rectangular,pellets
Size 1''- 8''mm,As per your request
Technolgy Melting
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Ceramic materials,Vaccum coating,Process,Decoration,LED,Semi,
Related products AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203,
AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.

Aluminium Oxide Sputtering Target is a crucial component in the process of thin film deposition. This material plays a key role in creating high-quality coatings on various surfaces, ensuring optimal performance and durability. With its excellent thermal and chemical stability, Aluminium Oxide Sputtering Target is highly sought after in industries such as electronics, optics, and aerospace. Its ability to efficiently transfer material onto a substrate makes it a valuable tool for researchers and manufacturers alike. When looking for a reliable and efficient sputtering target, Aluminium Oxide is definitely a top choice. Its versatility and reliability make it a staple in the world of thin film deposition.
High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
Available for COA( Certificate of Analysis)

High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material

High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material

High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
Changsha Xinkang Advanced Materials Co., Ltd (XK) is an international company involved in the R & D, manufacturing, and sales of many types of high-tech materials. We provide high-purity materials, customized alloys, compounds, and almost every kind of complicated synthetic materials to research institutes and high-tech enterprises worldwide. We have significant advantages in high-purity metals, high-purity compounds, rare-earth metals, powder materirals, coated substrates, along with many other materials.
ASTM/B ASME SB, AMS, DIN, JIS and other requirements fromcustomers. And these products have
been widely used in the petrochemical industry, aerospace and aviation, shipbuilding, energy, medical,
military, electronics, environmental protection, machinery and instruments, metallurgy, automotive and
other fields.
Our factory is located in Changsha, Hunan, which covers an area of 4000 square meters. It has
been certificated with IS09001:2015 quality management system and IS014001:2015 environmental
management system. At present, the company is well equipped with Hi-tech equipment and a huge
contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur
instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional
technician, skilled workers and advanced equipment enable us to present products and services with
high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore,
India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are
highly appreciated by our customers.
Regardless of the order volume and size, we will try our best to meet your requirements and we are doing this for years
High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition MaterialHigh Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition MaterialHigh Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material

High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material


High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition MaterialHigh Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material
Standard export packaging: Vacuum sealed package inside; export carton or wooden case outside
Shipment can be made by Fedex, DHL, UPS, *** express etc.
for gross weight ≤100KG; For large shipment ≥100KG , shipping method will be discussed with you.
High Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition MaterialHigh Purity 99.5%-99.95% Al2O3 Ceramic Target for Thin Film Deposition Material

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