High Purity 99.95% Metal Tantalum Rotary Target Ta Tantalum Magnetron Sputtering Targets

Product Description

Product Description

 

Factory price High Purity 99.95% Metal tantalum Rotary Target Ta Tantalum Magnetron sputtering targets for pvd coating

Name	Metal Tantalum Ta magnetron sputtering target
Purity	99.9%-99.995%
Size	372x74x6mm, D3x3mm,D6x6mm,D50.8x3mm, 2inch,3inch, As request
Boiling Point	54257
Density	16.654g/cm³
Melting Point	2996.0
Shape	Planar target, Rotary target,Arc Cathode.
MOQ	1PCS
Application	Evaporation materials, PVD Film Coating and etc

 

Tantalum, a metallic element, occurring chiefly in tantalite and associated with niobium. Tantalum has moderate hardness and good ductility, and can be drawn into thin wire foil. It's a small Coefficient of thermal expansion. Tantalum has excellent chemical property and is highly resistant to corrosion. Although tantalum is highly resistant to corrosion, its resistance to corrosion is due to the formation of a stable tantalum pentoxide (TA2O5) protective film on its surface. It does not react with hydrochloric acid, concentrated nitric acid or"Aqua regia" under both cold and hot conditions. It can be used to make evaporator and so on. It can also be used as electrode of electron tube, rectifier and electrolytic capacitor. Used medically to make sheets or threads to sew up damaged tissue.

 

Capacitors are the most important use of tantalum.

Tantalum is also used to make electron emission tubes and high-power electron tube parts. Tantalum corrosion-resistant equipment is used in the production of strong acid, bromine, ammonia and other chemical industries.

Tantalum can be used as a structural material for the combustor of aircraft engines. Tantalum-tungsten, tantalum-tungsten-hafnium and tantalum-hafnium alloys are used as heat-resistant and high-strength materials for rockets, missiles and jet engine, and as components in control and conditioning equipment.

Tantalum is easy to be machined and shaped. It is used as supporting accessory, heat shield, heater and heat sink in high temperature vacuum furnace.

Tantalum can be used as orthopaedic and surgical materials.

Tantalum carbide is used to make cemented carbide.

Tantalum boride, silicide, nitride and their alloys are used as heat release elements and liquid metal cladding materials in the atomic energy industry.

Tantalum oxide is used in the manufacture of advanced optical glasses and catalysts.

 

Application: Tantalum Sputtering Targets

Other Related Sputtering Targets

Metal Target	Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets
Alloy Target	Ni,Fe,Co,Cu,Al alloy. and special alloy
Evaporation Materials	Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc
Ceramic Targets	Oxide Ceramic, Compound ceramic targets.

    

Company Information

 

FAQ

 

1. Are you trading company or manufacturer ?
Xinkang: We are a professional manufacturer specialized in this field for over 10 years.

 

2: How long is your delivery time?
Xinkang: Shipment can be made in 5-7 days for those regular size, or samples , and 15-20 days for batch quantity. 
 
3: Do you have MOQ ? 
Xinkang: No, we support samples.

 

4: What is your payment method?
Xinkang: T/T in advance, Paypal , Western Union and etc.