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  • 99.99% Pure Cu2znsns4 Compound Material Czts Sputtering Target for PVD Coating Machine
  • 99.99% Pure Cu2znsns4 Compound Material Czts Sputtering Target for PVD Coating Machine
  • 99.99% Pure Cu2znsns4 Compound Material Czts Sputtering Target for PVD Coating Machine
  • 99.99% Pure Cu2znsns4 Compound Material Czts Sputtering Target for PVD Coating Machine
  • 99.99% Pure Cu2znsns4 Compound Material Czts Sputtering Target for PVD Coating Machine
  • 99.99% Pure Cu2znsns4 Compound Material Czts Sputtering Target for PVD Coating Machine
Type: Ceramic Target
Shape: Plannar, Round,
Usage: Thin Film Coating
Size: Accept Custom
Purity: High Purity
Grade: Industrial Grade
Customization:

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