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  • High Entropy Alloy Purity 4n 5n Nickel Sputtering Target for PVD Coating
  • High Entropy Alloy Purity 4n 5n Nickel Sputtering Target for PVD Coating
  • High Entropy Alloy Purity 4n 5n Nickel Sputtering Target for PVD Coating
  • High Entropy Alloy Purity 4n 5n Nickel Sputtering Target for PVD Coating
  • High Entropy Alloy Purity 4n 5n Nickel Sputtering Target for PVD Coating
  • High Entropy Alloy Purity 4n 5n Nickel Sputtering Target for PVD Coating
Material: Nickel Cobalt Chromium Aluminum Yttrium Tantalum
Application: Vacuum Coating, Surface Treatment,
Shape: Round, Rectangular,Pellets
Delivery Time: 15-18days
Keywords: Nickel Sputtering Target for PVD Coating
Size: 1′′,2′′,as Your Request
Customization:

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